6.777J/2.751J Material Property Database

 

Material:  LPCVD Silicon Nitride (stoichiometric)

 

Property

Value

Reference

Image/URL (optional)

Mass density

3.18 g/cm^3  

Pierson, Hugh O., Handbook of chemical vapor deposition
(CVD) : principles, technology, and applications, 2nd edition. Knovel, Ch.
10, pg. 281

 

 

Young's modulus

270 Gpa  

Pierson, Hugh O., Handbook of chemical vapor deposition (CVD) :
principles, technology, and applications, 2nd edition. Knovel, Ch. 10, pg.281

 

 

Poisson ratio

0.27 

Pierson, Hugh O., Handbook of chemical vapor deposition (CVD) :
principles, technology, and applications, 2nd edition. Knovel, Ch. 10, pg.281

 

 

Stiffness Constants

-

 

 

Tensile or fracture strength

980 MPA 

Senturia, Stephen, Microsystems Design

 

Residual stress on silicon

1100

MPA   Senturia, Stephen, Microsystems Design

 

 

Specific heat

0.54-0.7 J/g K

Pierson, Hugh O., Handbook of chemical vapor deposition
(CVD): principles, technology, and applications, 2nd edition. Knovel, Ch.
10, pg. 281

 

 

Thermal conductivity

25-36 W/m C 

Pierson, Hugh O., Handbook of chemical vapor deposition
(CVD) : principles, technology, and applications, 2nd edition. Knovel, Ch.
10, pg. 281

 

 

Dielectric constant

7.9-8.14  

Pierson, Hugh O., Handbook of chemical vapor deposition (CVD) :
principles, technology, and applications, 2nd edition. Knovel, Ch. 10, pg.
281

 

 

Index of refraction

2.01  

Madou, Marc J., Fundamentals of microfabrication : the science of
miniaturization, Boca Raton, Fla. : CRC Press, c2002, Table 5.13

 

 

Electrical conductivity

-

Resistivity: 10^16 Ohm-cm   Madou, Marc J., Fundamentals of
microfabrication : the science of miniaturization, Boca Raton, Fla. : CRC
Press, c2002, Table 5.13

 

 

Magnetic permeability

-

 

 

Piezoresistivity

-

 

 

 

Piezoelectricity

-

 

 

 

Wet etching method

H3PO4, BHF, HF  

Madou, Marc J., Fundamentals of microfabrication : the
science of miniaturization, Boca Raton, Fla. : CRC Press, c2002, Table 5.15

 

 

Plasma etching method

-

 

 

Adhesion to silicon dioxide

good

http://www.biomems.net/Classes/MSE621/MSE62101(14).pdf

 

Biocompatibility

 

 

 

 

Hydrophobicity