6.777J/2.751J Material Property
Database
Material: Polyimide
Property |
Value |
Reference |
Image/URL (optional) |
Mass density |
1.42 g/cc |
“Dupont Kapton Polyimide Film General Specifications,
Bulletin GS-96-7”.
http://www.dupont.com/kapton/general/H-38479-4.pdf |
|
Young's modulus |
2.5 GPa |
“Dupont Kapton Polyimide Film General Specifications,
Bulletin GS-96-7”.
http://www.dupont.com/kapton/general/H-38479-4.pdf |
|
Poisson ratio |
0.34 @ 23°C |
“Dupont Kapton Polyimide Film General Specifications,
Bulletin GS-96-7”. http://www.dupont.com/kapton/general/H-38479-4.pdf |
|
Stiffness Constants (if crystalline) |
|
|
|
Tensile strength |
231 MPa
@ 23°C 139 MPa
@ 200°C |
“Dupont Kapton Polyimide Film General Specifications,
Bulletin GS-96-7”.
http://www.dupont.com/kapton/general/H-38479-4.pdf |
|
Residual stress on silicon |
35MPa @5 μm
, on 8” wafer, 375°C cure |
“Photodefinable HD-4000 Series Polyimide Product
Bulletin.”
http://www.hdmicrosystems.com |
|
Specific heat |
1.09 J/(g*K) 0.261 cal/(g*°C) |
“Dupont Kapton Polyimide Film General Specifications,
Bulletin GS-96-7”. http://www.dupont.com/kapton/general/H-38479-4.pdf |
|
Thermal conductivity |
0.12 W/(mK) 2.87e-4 cal/(cm*sec*°C) |
“Dupont Kapton Polyimide Film General Specifications,
Bulletin GS-96-7”.
http://www.dupont.com/kapton/general/H-38479-4.pdf |
|
Dielectric constant |
3.4 @ 25 μm,
1kHz |
“Dupont Kapton Polyimide Film General Specifications,
Bulletin GS-96-7”.
http://www.dupont.com/kapton/general/H-38479-4.pdf |
|
Index of refraction |
1.70 |
“Dupont Kapton Polyimide Film General Specifications,
Bulletin GS-96-7”. http://www.dupont.com/kapton/general/H-38479-4.pdf |
|
Electrical conductivity |
1.5e17 Ωcm |
“Dupont Kapton Polyimide Film General
Specifications, Bulletin GS-96-7”.
http://www.dupont.com/kapton/general/H-38479-4.pdf |
|
Magnetic permeability |
|
|
|
Piezoresistivity (if a conductor) |
|
|
|
Piezoelectricity coefficient |
3.8e-12c/N (in abstract) 3.8e-3c/N in table in body of
paper |
Tong, Yuejin, et. al. “Preparation
and properties of polyimide films codoped with
barium and titanium oxides.” |
|
Wet etching
method |
TMAH developer can be used to
develop exposed photoresist and etch unmasked underlying polyimide in one
step. |
“Product
Bulletin PI-2545 Wet Etch Polyimide.”
http://www.hdmicrosystems.com |
|
Plasma etching
method |
Use PECVD silicon nitride mask
and use O2 plasma etch, possibly with CF4 |
Lee, Y.K. et al.
“Reactive Ion Etich of the Fluorinated
Polyimide Film.” Advanced
Metallization for Future ULSI.
Symposium, 1996, p 455-61.
Abstract. |
|
Adhesion to silicon dioxide |
Varies; “A separate adhesion
promoter is recommended with PI-2525, PI-2555, PI-2556 to promote adhesion to
oxides and metals. PI-2575 is self
priming and does not require an adhesion promoter.” |
“Product Information Pyralin
PI2525, PI2555, PI-2575 & PI2556.”
http://www.hdmicrosystems.com |
|
Biocompatibility |
Used in Bio-MEMS an implantable
intracortical electrode array. “Polyimide
also provides an ideal surface for the selective attachment of various
important bioactive species onto the device in order to encourage favorable
long-term reactions at the tissue-electrode interface.” “Overall polyimide is a proven biocompatible material and an
excellent choice for neuroprosthetic applications.” |
|
Can be found
using IEEE Xplore |
Hydrophobicity |
82 degrees |
Ghosh, |
|
Melting point |
Does
not melt, Decomposes
at 520°C |
“Dupont Kapton Polyimide Film General
Specifications, Bulletin GS-96-7”.
http://www.dupont.com/kapton/general/H-38479-4.pdf |
|