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Chemically Amplified Resists
Polymer chemist Elsa Reichmanis was born on December 9, 1953
in Melbourne, Australia. As a child she emigrated with her family
to the United States and grew up in Syracuse, New York. An impressive
student, she graduated from high school early and enrolled at
Syracuse University as a chemistry major. There too, she excelled
in her studies and completed her B.S. degree in three years,
graduating in 1972. Just three years later, she also completed
a doctoral degree at Syracuse; she was awarded a Ph.D. in organic
chemistry in 1975 at the age of 22.
From there, Reichmanis spent three years working as a postdoctoral
fellow and wrestled with the decision between an academic
career and one in the commercial world. She chose the latter
path, accepting a staff position with AT&T Bell Laboratories,
currently known as Bell Labs, Lucent Technologies, in Murray
Hill, N.J.
It was not long before Reichmanis began to make her mark
with the company, and quickly she found herself at the forefront
of her field, working to design materials suitable for use
in the communications network infrastructure of the future.
In the 1980s, she and her research group took on the task
of developing advanced materials meant for the burgeoning
semiconductor industry. Reichmanis worked on new materials
for nanoscale fabrication of the layers of lines and channels
on silicon chips made using optical lithography.
In the field of semiconductor manufacturing, the process
of defining or outlining patterns on silicon wafers so that
materials can be applied to or removed from them according
to these "maps" to make the chip work is called
lithography. Optical lithography uses visible or ultraviolet
light to project patterns on the wafer. In order for this
to work, the wafer is coated with a chemical substance known
as a "photoresist," which captures the desired pattern
similar to the way photographic paper captures an image.
Photoresists have been a focus of Reichmanis' work. She
and her team developed advanced materials of this type for
faster, more powerful chips with smaller and smaller components;
today's semiconductors can have more than 40 million transistors
each. Groundbreaking materials she and her team developed
known as "chemically amplified resists" are currently
used in silicon fabrication facilities around the world. Her
team was among the first to come up with materials that would
be suitable for the rapidly advancing world of chips that
were necessary for the new millennium.
Reichmanis has continued to make major contributions to
her field over the course of her career with Bell Labs. She
served for six years on the Technical Staff with the company's
Organic Chemistry Research and Development department, followed
by a post as Technical Manager, Radiation Sensitive Materials
and Applications, which she held for ten years until 1994.
That year she was promoted to Director, Polymer and Organic
Materials Research, a position she holds as of this writing
(2005).
She has worked on a variety of projects including, most
recently, the design and application of photonic polymer technologies
for optical networks. Some of her past accomplishments include
working with E Ink Corp. to create the world's first, reusable,
all-plastic "electronic paper." And with DuPont
and Sarnoff Corp. she helped develop a material for light,
portable, flexible color display screens.
Married and mother to four children, Reichmanis is active
in a number of professional societies and organizations, has
several patents, five books, and more than 150 publications
to her credit. Her long list of honors and awards include
the 1992 R&D 100 Award from Research and Development Magazine;
the 1993 Achievement Award from the Society of Women Engineers;
the 1996 ASM International Engineering Materials Achievement
Award; and the 2001 Perkin Medal. In addition, she was elected
to the National Academy of Engineering in 1995; she became
an AT&T Bell Laboratories Fellow, also in 1995; and she was
named a Fellow of the American Association for the Advancement
of Science in 1997. In 2003, Reichmanis was elected president
of the American Chemical Society (ACS).
[October 2005] |