Publications (1997+) and Patents

  • Lau, K. K. S.; Gleason K.K., Particle surface design by an all-dry encapsulation method. Advanced Materials 2006, 18, 1972-1977.

  • Lock, J. P.; Im, S. G.; Gleason, K. K., Oxidative Chemical Vapor Deposition of Electrically Conducting Poly 3,4 Ethylenedioxythiophene (PEDOT) Films. Macromolecules 2006, 39, 5326-5329.
  • O’Shaughnessy W. S.; Gao, M.; Gleason, K. K., Initiated chemical vapor deposition (iCVD) of trivinyl-trimethyl cyclotrisiloxane for biomaterial coatings. Langmuir 2006, 22, 7021-7126.
  • Gorga, R. E.; Lau, K. K. S.; Gleason, K. K.; Cohen, R. E., The Importance of Interfacial Design at the Carbon Nanotube/Polymer Composite Interface, Journal of Applied Polymer Science 2006, 102, 1413-1418.
  • Chan, K.; Gleason, K. K., Air-Gap Fabrication Using a Sacrificial Polymeric Thin Film Synthesized via Initiated\Chemical Vapor Deposition. J Electrochem Soc 2006,153, C223-C228.
  • Lau, K. K. S.; Gleason, K K. Initiated Chemical Vapor Deposition (iCVD) of Poly(alkyl acrylates): A Kinetic Model. Macromolecules 2006, 39, 3695-3303.
  • Lau, K. K. S.; Gleason, K. K., Initiated Chemical Vapor Deposition (iCVD) of Poly(alkyl acrylates): An Experimental Study. Macromolecules 2006, 39, 3688-3694.
  • Ross, A. D.; Gleason, K. K., The CVD of Nanocomposites Fabricated via Ultrasonic Atomization. Chemical Vapor Deposition 2006, 12, (4), 225-230.
  • Chan. K.; Gleason, K. K., A Mechanistic Study of Initiated Chemical Vapor Deposition of Polymers: Analyses of Deposition Rate and Molecular Weight. Macromolecules 2006 39, 3890-3894.
  • Mao, Y.; Gleason, K. K., Vapor-Deposited Fluorinated Glycidyl Copolymer Thin Films with Low Surface Energy and Improved Mechanical Properties. Macromolecules 2006, 39, 3895-3900.
  • Mao, Y; Felix, N. M.; Nguyen, P. T.; Ober, C. K.; Gleason, K. K., Positive- and Negative-Tone CVD Polyacrylic Electron-Beam Resists Developable by Supercritical CO2. Chemical Vapor Deposition 2006, 12, 259-262.
  • Mao, Y.; Gleason, K. K., Positive-Tone Nanopatterning of Chemical Vapor Deposited Polyacrylic Thin Films. Langmuir 2006, 22, 1795-1799.
  • Casserly, T. B.; Gleason, K. K., Effect of substrate temperature on the plasma polymerization of poly(methyl methacrylate). Chemical Vapor Deposition 2006, 12, 59-66. 
  • Chan K.; Gleason, K. K., Photoinitiated chemical vapor deposition of polymeric thin films using a volatile photoinitiator. Langmuir 2005, 21, 11773-11779.
  • Poliskie, G. M.; Gleason, K. K., Stress relaxation of polyisoprene-laponite nanocomposites monitored by magic angle spinning 1H NMR and optical microscopy. Polymer Composites 2005, 26, 799-805.
  • Casserly, T. B.; Gleason, K. K., Enthalpies of Formation and Reaction for Primary Reactions of Methyl- and Methylmethoxysilanes from Density Functional Theory. Plasma Processes and Polymers 2005, 2, 669-678.
  • Casserly, T. B.; Gleason, K. K., Chemical Vapor Deposition of Organosilicon Thin Films from Methoxysilane. Plasma Processes and Polymers 2005, 2, 679-698.
  • Ma, M.; Mao, Y.; Gupta, M.; Gleason, K. K., Rutledge, G. C., Superhydrophobic Fabrics Produced by Electrospinning and Chemical Vapor Deposition. Macromolecules 2005, 38, 9742-9748.
  • Poliskie, G. M.; Haddad, T. S.; Blanski, R. L.; Gleason, K. K., Characterization of the phase transitions of ethyl substituted polyhedral oligomeric silsesquioxane. Thermochimica Acta 2005, 438,116-125.
  • Chan, K.; Gleason, K. K., Initiated CVD of Poly(methyl methacrylate) Thin Films. Chemical Vapor Deposition 2005, 11, 437-443.
  • Poliskie, G. M.; Cohen, R. E.; Gleason, K. K., Static uniaxial compression of polyisoprene-montmorillonite nanocomposites monitored by H-1 spin-lattice relaxation time constants. Journal of Applied Polymer Science 2005, 98, (4), 1806-1813.
  • Chan, K.; Gleason, K. K., Initiated chemical vapor deposition of linear and cross-linked poly(2-hydroxyethyl methacrylate) for use as thin-film hydrogels. Langmuir 2005, 21, 8930-8939.
  • Sparacin,  D. K.; Hong, C. Y.; Kimerling,  L. C., et al., Trimming of microring resonators by photo-oxidation of a plasma-polymerized organosilane cladding material. Optics Letters 2005, 30, 2251-2253.
  • Casserly, T. B.; Gleason, K. K., Density functional theory calculation of Si-29 NMR chemical shifts of organosiloxanes. Journal of Physical Chemistry B 2005, 109, 13605-13610.
  • Wu, Q. G.; Ross, A. D.; Gleason, K. K., Nanoporous organosilicate glass films via chemical vapor deposition onto colloidal crystal templates. Plasma Processes and Polymers 2005, 2, 401-406.
  • Ross, A. D.; Gleason, K. K., Effects of condensation reactions on the structural, mechanical, and electrical properties of plasma-deposited organosilicon thin films from octamethylcyclotetrasiloxane. J Appl Phys 2005, 97, 113707.
  • Ross, A. D.; Gleason, K. K., Enhancement of mechanical properties of organosilicon thin films deposited from diethylsilane. Journal of Vacuum Sci Technol A 2005, 23, 465-469.
  • Lock, J. P.; Gleason, K. K., Tunable waveguides via photo-oxidation of plasma-polymerized organosilicon films. Applied Optics 2005, 44, 1691-1697.
  • Mabboux, P. Y.; Gleason, K. K., Chemical bonding structure of low dielectric constant Si : O : C : H films characterized by solid-state NMR. JECS 2005, 152, F7-F13.
  • Murthy S. K.; Olsen,  B. D.; Gleason, K. K., Peptide Attachment to Vapor Deposited Polymeric Thin Films. Langmuir 2004, 20, 4774.
  • Mao, Y.; Gleason, K. K., Hot Filament Chemical Vapor Deposition of Poly(glycidyl methacrylate) Thin Films Using tert-Butyl Peroxide as an Initiator. Langmuir  2004, 20, (6), 2484-2488.
  • Loo,  L. S.; Gleason, K. K., Investigation of polymer and nanoclay orientation distribution in nylon 6 /montmorillonite nanocomposite. Polymer 2004, 45, 5933-5939.
  • Burkey, D. D.; Gleason, K. K., Organosilicon Thin Films Deposited from Cyclic and Acyclic Precursors Using Water as an Oxidant. Journal of the Electrochemical Society 2004, 151, F105.
  • Mao, Y.; Felix N. M.; Nguyen, P. T.; Ober, C. K.; Gleason, K. K., Towards all-dry lithography: Electron-beam patternable poly(glycidyl methacrylate) thin films from hot filament chemical vapor  deposition. Journal of Vacuum Science & Technology B 2004, 22, 5.
  • Murthy, S. K. E.; Edell, D. J.; Gleason, K. K., In Neuroprosthetics: Theory and Practice (Horch K. W. D.; Dhillon, G. S., Eds.) (World Scientific, 2004).
  • Murthy S. K.; Olsen, B. D.; Gleason, K. K., Effect of filament temperature on the chemical vapor deposition of fluorocarbon-organosilicon copolymers. Journal of Applied Polymer Science 2004, 91, 2176-2185.
  • Mao Y.; Gleason, K. K., Hot Filament Chemical Vapor Deposition of Poly(glycidyl-methacrylate)  Thin Films Using tert-Butyl Peroxide as an Initiator. Langmuir 2004, 20, 2484-2488.
  • Murthy, S. K. E., D.J.; Gleason, K. K., In Neuroprosthetics: Theory and Practice (ed. Horch, K. W. D., G., Eds.) (World Scientific, 2004).
  • Murthy, S. K., Vapor Deposition of Biopassivation Coatings for Neuroprostheses, in Neuroprosthetics (ed. Scientific, W.) (Singapore 2004, 2004).
  • Murthy, S. K., Olsen, B. D. & Gleason, K. K., Effect of filament temperature on the chemical vapor deposition of fluorocarbon-organosilicon copolymers. Journal of Applied Polymer Science 2004, 91, 2176-2185.
  • Mao, Y. & Gleason, K. K., Hot Filament Chemical Vapor Deposition of Poly(glycidylmethacrylate) Thin Films Using tert-Butyl Peroxide as an Initiator. Langmuir 2004, 20, 2484-2488.
  • Wu, Q.; Gleason, K. K., Plasma-enhanced chemical vapor deposition of low-k dielectric films using methylsilane, dimethylsilane, and trimethylsilane precursors. Journal of Vacuum Science and Technology A 2003, 21, (2), 388-393.
  • Wu, Q.; Gleason, K. K., Plasma-enhanced CVD of organosilicate glass (OSG) films deposited from octamethyltrisiloxane, bis(trimethylsiloxy)methylsilane, and 1,1,3,3-tetramethyldisiloxane. Plasmas and Polymers 2003, 8, (1), 31-41.
  • Poliskie, G. M.; Cohen, R. E.; Gleason, K. K., Stress relaxation of polyisoprene and polyisoprene nanocomposites monitored by 1H NMR. Polymer Preprints (American Chemical Society, Division of Polymer Chemistry) 2003, 44, (1), 271-272.
  • Loo, L. S.; Gleason, K. K., Fourier transform infrared investigation of the deformation behavior of montmorillonite in nylon-6/nanoclay nanocomposite. Macromolecules 2003, 36, (8), 2587-2590.
  • Loo, L. S.; Gleason, K. K., Insights into structure and mechanical behavior of and crystal forms of nylon-6 at low strain by infrared studies. Macromolecules 2003, 36, (16), 6114-6126.
  • Lin, J.; Murthy, S. K.; Olsen, B. D.; Gleason, K. K.; Klibanov, A. M., Making thin polymeric materials, including fabrics, microbicidal and also water-repellent. Biotechnology Letters 2003, 25, (19), 1661-1665.
  • Lau, K. K. S.; Murthy, S. K.; Lewis, H. G. P.; Caulfield, J. A.; Gleason, K. K., Fluorocarbon dielectrics via hot filament chemical vapor deposition. Journal of Fluorine Chemistry 2003, 122, (1), 93-96.
  • Burkey, D. D.; Gleason, K. K., Structure and thermal properties of thin film poly(a-methylstyrene) deposited via plasma-enhanced CVD. Chemical Vapor Deposition 2003, 9, (2), 65-71.
  • Burkey, D. D.; Gleason, K. K., Structure and mechanical properties of thin films deposited from 1,3,5-trimethyl-1,3,5-trivinylcyclotrisiloxane and water. Journal of Applied Physics 2003, 93, (9), 5143-5150.
  • Murthy, S. K.; Gleason, K. K., Fluorocarbon-organosilicon copolymer synthesis by hot filament chemical vapor deposition. Macromolecules 2002, 35, (5), 1967-1972.
  • Murthy, S. K.; Olsen, B. D.; Gleason, K. K., Initiation of cyclic vinylmethylsiloxane polymerization in a hot-filament chemical vapor deposition process. Langmuir 2002, 18, (16), 6424-6428.
  • Murthy, S. K.; Gleason, K. K., Hot-filament chemical vapor deposition: A novel technique for the synthesis of fluorocarbon-organosilicon copolymer thin films. Polymeric Materials Science and Engineering 2002, 87, 151-152.
  • Mabboux, P.-Y.; Gleason, K. K., 19F NMR characterization of electron beam irradiated vinylidene fluoride-trifluoroethylene copolymers. Journal of Fluorine Chemistry 2002, 113, (1), 27-35.
  • Cruden, B. A.; Gleason, K. K.; Sawin, H. H., Relationship of CF2 concentration to deposition rates in the pyrolytic chemical vapor deposition process. Journal of Vacuum Science and Technology B 2002, 20, (2), 690-695.
  • Cruden, B. A.; Gleason, K. K.; Sawin, H. H., Ultraviolet absorption measurements of CF2 in the parallel plate pyrolytic chemical vapor deposition process. Journal of Physics D 2002, 35, (5), 480-486.
  • Cruden, B. A.; Gleason, K. K.; Sawin, H. H., Optical emission spectroscopy of pulsed hexalfuoropropylene oxide and tetrafluoroethylene plasmas. Journal of Applied Physics 2002, 91, (12), 9547-9555.
  • Burkey, D. D.; Gleason, K. K., Structure and thermal properties of plasma-deposited thin film poly(alpha-methylstyrene). Polymeric Materials Science and Engineering 2002, 87, 448-449.
  • Loo, L.S., Gleason, K.K. Hot filament chemical vapor deposition of polyoxymethylene as a sacrificial layer for fabricating air gaps. Electrochem. Solid-State Letters,2001, 4, G81.
  • Pryce Lewis, H.G., Weibel, G., L., Ober, C.K., Gleason, K.K. E-Beam Patterning of Hot-Filament CVD Fluorocarbon Films Using Supercritical CO2 as a Developer (PDF File) Chemical Vapor Deposition, 2001, 7, 195.
  • Pryce Lewis, H.G., Caufield, J.A., Gleason, K.K.Perfluorooctane Sulfonyl Fluoride as an Initiator in Hot-Filament CVD Flurorocarbon Thin Films (PDF File) Langmuir, 2001, 17, 7652.
  • Pryce Lewis, H.G., Casserly, T.B., Gleason, K.K. Hot-filament chemical vapor deposition of organosilicon thin films from hexamethylcyclotrisiloxane and octamethylcyclotetrasiloxane (PDF File) J. Electrochem. Soc.2001, 148, F212.
  • Lau KKS, Gleason KK. Thermal annealing of fluorocarbon films grown by hot filament chemical vapor deposition. J. of Phys. Chem. B, 2001, 105, 2303-2307.
  • Lau, K.K.S.; Pryce Lewis, H.G.; Limb, S.J.; Kwan, M.C.; Gleason, K.K. Hot-wire chemical vapor deposition (HWCVD) of fluorocarbon and organosilicon thin films. Thin Solid Films,2001, 395, 288.
  • Labelle, C. B.; Gleason, K. K., Pulsed plasma deposition from 1,1,2,2-tetrafluoroethane by electron cyclotron resonance and conventional plasma enhanced chemical vapor deposition. Journal of Applied Polymer Science 2001, 80, (11), 2084-2092.
  • Gleason, K. K.; Hill, D. J. T.; Lau, K. K. S.; Mohajerani, S.; Whittaker, A. K., The use of 19F NMR for new structure determination in the radiolysis of FEP. Nuclear Instruments and Methods in Physics Research Section B 2001, 185, 83-87.
  • Labelle CB, Gleason KK. Time resolved ultraviolet absorption spectroscopy of pulsed fluorocarbon plasmas. J. Appl. Poly. Sci., 2001, 80, 2084-2092.
  • Cruden BA, Gleason KK, Sawin HH. Time Resolved Ultraviolet Absorption Spectroscopy of Pulsed Fluorocarbon Plasmas (PDF File) J. Appl. Phys., 2001, 89, 915-922.
  • Winder EJ, Gleason KK. Growth and characterization of fluorocarbon thin films grown from trifluoromethane (CHF3) using pulsed-plasma enhanced CVD. J. Appl. Polymer Sci., 2000, 78, 842-849.
  • Weibel, G. L.; Lewis, H. G. P.; Gleason, K. K.; Ober, C. K., Patternable low-k dielectrics developed using supercritical CO2. Polymer Preprints (American Chemical Society, Division of Polymer Chemistry) 2000, 41, (2), 1838-1839.
  • Loo LS, Cohen RC, Gleason KK. Chain mobility in the amorphous region of nylon 6 observed under active uniaxial deformation. Science, 2000, 288, 116-119.
  • Loo LS, Cohen RC, Gleason KK. Deuterium nuclear magnetic resonance of deuterium oxide in nylon 6 under active uniaxial deformation.Polymer, 2000, 41, 7699-7704.
  • Pryce Lewis HG, Edell DJ, Gleason KK. Pulsed-PECVD Films from hexamethylcyclotrisiloxane for use as insulating biomaterials. Chem. Mater., 2000, 12, 3488-3494.
  • Lau KKS, Gleason KK. Pulsed plasma enhanced and hot filament chemical vapor deposition of fluorocarbon films.J. Fluorine Chem., 2000, 104, 119-126.
  • Lau KKS, Gleason KK, Trout BL. Thermochemistry of gas phase CF2 reactions: A density functional theory study. The Journal of Chemical Physics, 2000, 113, 4103-4108.
  • Lau KKS, Caulfield JA, Gleason KK. Structure and morphology of fluorocarbon films grown by hot filament chemical vapor deposition. Chem. of Mater., 2000, 12, 3032-3037.
  • Lau KKS, Caulfield JA, Gleason KK. Variable angle spectroscopic ellipsometry of fluorocarbon films from hot filament chemical vapor deposition.J. Vac. Sci. Tech. A, 2000, 18, 2404-2411.
  • Labelle CB, Gleason KK. Overhang test structure deposition profiles of pulsed plasma fluorocarbon films from hexafluoropropylene oxide, 1,1,2,2-tetrafluoroethane, and difluoromethane. Adv. Materials:Chem. Vap. Dep., 2000, 6, 27-32.
  • Labelle, C. B.; Gleason, K. K., Fourier transform infrared spectroscopy study of thermal annealing behavior of ECR pulsed plasma deposited fluorocarbon thin films from 1,1,2,2-tetrafluoroethane. Journal of the Electrochemical Society 2000, 147, (2), 678-681.
  • Loo LS, Cohen RE, Gleason KK. Deuterium nuclear magnetic resonance of phenol-d5 in nylon 6 under active uniaxial deformation. Macromolecules , 1999, 32, 4359.
  • Limb SJ, Lau KKS, Edell DJ, Gleason EF, Gleason KK. Molecular design of fluorocarbon film architecture by pulsed plasma enhanced and pyrolytic chemical vapor deposition. Plasmas and Polymers , 1999, 4(1), 21-32.
  • Lau KKS, Gleason KK. Solid-state nuclear magnetic resonance spectroscopy of low dielectric constant films from pulsed hydrofluorocarbon plasmas. J. Electrochem. Soc., 1999, 146, 2652.
  • Lau, K. K. S.; Labelle, C. B.; Gleason, K. K., Low dielectric constant CVD fluorocarbon films. Polymeric Materials Science and Engineering 1999, 81, 73-74.
  • Labelle, C. B.; Gleason, K. K., Pulsed plasma-enhanced chemical vapor deposition from CH2F2, C2H2F4, and CHClF2. Journal of Vacuum Science and Technology A 1999, 17, (2), 445-452.
  • Labelle CB, Gleason KK. Surface morphology of PECVD fluorocarbon thin films from hexafluoropropylene oxide, 1,1,2,2-tetrafluoroethane, and difluoromethane. J. Appl. Polym. Sci. , 1999, 74, 2439-2447.
  • Labelle CB, Karecki SM, Reif LR, Gleason KK. Fourier transform infrared spectroscopy of effluents from pulsed plasmas of 1,1,2,2-tetrafluoroethane, hexafluoropropylene oxide, and difluoromethane. J. Vac. Sci. Technol. A. , 1999, 76, 3419.
  • Cruden B, Chu K, Gleason K, Sawin H. Thermal decomposition of low dielectric constant pulsed plasma fluorocarbon films I. Effect of precursors and substrate temperature. J. Electrochem. Soc., 1999, 146, 4590-4596.
  • Cruden B, Chu K, Gleason K, Sawin H. Thermal decomposition of low dielectric constant pulsed plasma fluorocarbon films II. Effect of postdeposition annealing and ambients. J. Electrochem. Soc., 1999, 146, 4597-4604.
  • Chiarello, R.; Muscat, A.; Boning, D.; Gleason, K.; Karecki, S.; Raghavanl, S., Multidisciplinary approaches. Target ES&H. Semiconductor International 1999, 22, (2), 62-64,66.
  • Banerjee I, Harker M, Wong L, Coon PA, Gleason KK. Characterization of chemical vapor deposited amorphous fluorocarbons for low dielectric constant interlayer dielectrics. J. Electrochem. Soc. , 1999, 146, 2219.
  • Wolden, C.; Mitra, S.; Gleason, K. K., Radiative heat transfer in hot-filament chemical vapor deposition diamond reactors. Journal of Applied Physics 1992, 72, (8), 3750-8.
  • Scruggs, B. E.; Gleason, K. K., Photosensitive salt distribution in polymer films studied by fluorine-19 multiple-quantum NMR. Macromolecules 1992, 25, (7), 1864-9.
  • Scruggs, B. E.; Gleason, K. K., Multiple-quantum NMR coherence growth in polycrystalline salts containing fluorine-19. Journal of Magnetic Resonance 1992, 99, (1), 149-60.
  • Scruggs, B. E.; Gleason, K. K., Computer simulation of the multiple-quantum dynamics of one-, two-, and three-dimensional spin distributions. Chemical Physics 1992, 166, (3), 367-78.
  • McNamara, K. M.; Levy, D. H.; Gleason, K. K.; Robinson, C. J., Nuclear magnetic resonance and infrared absorption studies of hydrogen incorporation in polycrystalline diamond. Applied Physics Letters 1992, 60, (5), 580-2.
  • McNamara, K. M.; Gleason, K. K., Selectively carbon-13 enriched diamond films studied by nuclear magnetic resonance. Journal of Applied Physics 1992, 71, (6), 2884-9.
  • McNamara, K. M.; Gleason, K. K.; Robinson, C. J., Quantitative correlation of infrared absorption with nuclear magnetic resonance measurements of hydrogen content in diamond films. Journal of Vacuum Science and Technology A 1992, 10, (5), 3143-8.
  • McNamara, K. M.; Gleason, K. K.; Vestyck, D. J.; Butler, J. E., Evaluation of diamond films by nuclear magnetic resonance and Raman spectroscopy. Diamond and Related Materials 1992, 1, (12), 1145-55.
  • Levy, D. H.; Gleason, K. K.; Rothschild, M.; Sedlacek, J. H. C.; Takke, R., Reactions of hydrogenated defects in fused silica caused by thermal treatment and deep ultraviolet irradiation. Applied Physics Letters 1992, 60, (14), 1667-9.
  • Levy, D. H.; Gleason, K. K., Multiple quantum nuclear magnetic resonance as a probe for the dimensionality of hydrogen in polycrystalline powders and diamond films. Journal of Physical Chemistry 1992, 96, (20), 8125-31.
  • Scruggs, B.; Gleason, K., Sulfonium salt distribution in model polymer films by fluorine-19 multiple quantum NMR. Polymeric Materials Science and Engineering 1991, 65, 366-7.
  • Petrich, M. A.; Gleason, K. K.; Reimer, J. A., Structure and properties of amorphous hydrogenated silicon carbide. Physical Review B 1987, 36, (18), 9722-31.
  • Gleason, K. K.; Wang, K. S.; Chen, M. K.; Reimer, J. A., Monte Carlo simulations of amorphous hydrogenated silicon thin-film growth. Journal of Applied Physics 1987, 61, (8, Pt. 1), 2866-73.
  • Gleason, K. K.; Petrich, M. A.; Reimer, J. A., Hydrogen microstructure in amorphous hydrogenated silicon. Physical Review B 1987, 36, (6), 3259-67.
  • Baum, J.; Gleason, K. K.; Pines, A.; Garroway, A. N.; Reimer, J. A., Multiple-quantum NMR study of clustering in hydrogenated amorphous silicon. Physical Review Letters 1986, 56, (13), 1377-80.
  • Loo LS, Cohen RE, Gleason KK. Correlation times of motion of deuterium oxide in polyamide 6 rods. Macromolecules, 1998, 31(25), 8907.
  • Limb SJ, Edell DJ, Gleason EF, Gleason KK. Pulsed plasma-enhanced chemical vapor deposition from hexafluoropropylene oxide: film composition study. J. App. Polym. Sci., 1998, 67, 1489.
  • Lau KKS, Gleason KK. High resolution 19F MAS NMR spectroscopy of pulsed plasma-polymerized fluorocarbon films from pulsed PECVD of hexafluoropropylene oxide. J. Phys. Chem. B., 1998, 102, 5977.
  • Lau, K. K. S.; Gleason, K. K., High resolution 19F MAS NMR spectroscopy of pulsed plasma-polymerized fluorocarbon films. Polymer Preprints (American Chemical Society, Division of Polymer Chemistry) 1998, 39, (2), 936-937.
  • Labelle, C. B.; Gleason, K. K., Pulsed plasma enhanced chemical vapor deposition from C2H2F4, CH2F2, and CHClF2. Polymer Preprints (American Chemical Society, Division of Polymer Chemistry) 1998, 39, (2), 928-929.
  • Limb SJ, Gleason KK, Edell DJ, Gleason EF. Flexible fluorocarbon wire coatings by pulsed plasma enhanced chemical vapor deposition. J. Vac. Sci. & Technol. A, 1997, 15, 1814.
  • Lau KKS, Gleason KK. Structural correlation study of pulsed plasma-polymerized fluorocarbon solids by two-dimensional wide-line separation NMR spectroscopy. J. Phys. Chem. B, 1997, 101, 6839.
  • Labelle CB, Limb SJ, Gleason KK. Electron spin resonance of pulsed plasma-enhanced chemical vapor deposited fluorocarbon films. J. Appl. Phys., 1997, 82, 1784.
  • Kwan MC, Gleason KK. Pyrolytic CVD of poly(organosiloxane) thin films. Adv. Mats.: Chemical Vapor Deposition, 1997, 6, 299.
  • Chang WK, Gleason KK. Relationship of processing parameters to photoluminescence intensity and mechanical failure in thick porous silicon layers. Electrochem. Soc., 1997, 144, 1441.
  • Wolden, C. A.; Gleason, K. K., On the pressure limits of diamond chemical vapor deposition. Diamond and Related Materials 1996, 5, (12), 1503-1508.
  • Roy, A. K.; Gleason, K. K., Analytical solutions for multiple-quantum-coherence dynamics among two or three dipolar-coupled, spin-1/2 nuclei. Journal of Magnetic Resonance, Series A 1996, 120, (2), 139-147.
  • McNamara Rutledge, K.; Gleason, K. K., Hydrogen in CVD diamonds films. Chemical Vapor Deposition 1996, 2, (2), 37-43.
  • Limb, S. J.; Labelle, C. B.; Gleason, K. K.; Edell, D. J.; Gleason, E. F., Growth of fluorocarbon polymer thin films with high CF2 fractions and low dangling bond concentrations by thermal chemical vapor deposition. Applied Physics Letters 1996, 68, (20), 2810-2812.
  • Kwan, M. C.; Gleason, K. K., Method for achieving high selectivity and resolution in selectively deposited diamond films. Diamond and Related Materials 1996, 5, (9), 1048-1050.
  • Chang, W. K.; Liao, M. Y.; Gleason, K. K., Characterization of porous silicon by solid-state nuclear magnetic resonance. Journal of Physical Chemistry 1996, 100, (50), 19653-19658.
  • Rutledge, K. M. M.; Scruggs, B. E.; Gleason, K. K., Influence of hydrogenated defects and voids on the thermal conductivity of polycrystalline diamond. Journal of Applied Physics 1995, 77, (4), 1459-62.
  • Okano, K.; Gleason, K. K., Electron emission from phosphorus- and boron-doped polycrystalline diamond films. Electronics Letters 1995, 31, (1), 74-5.
  • Mukai, U.; Gleason, K. K.; Argon, A. S.; Cohen, R. E., Poly(dimethylsiloxane)/nylon-6 block copolymers: molecular mobility at the interface. Macromolecules 1995, 28, (14), 4899-903.
  • Gleason, K. K., Applications of solid-state multiple quantum NMR. Trends in Analytical Chemistry 1995, 14, (3), 104-12.
  • Wolden, C.; Gleason, K. K.; Howard, J. B., A reduced reaction mechanism for diamond deposition modeling. Combustion and Flame 1994, 96, (1-2), 75-9.
  • Scruggs, B. E.; Gleason, K. K., The role of proton nuclear magnetic resonance spin-lattice relaxation centers in the strong absorption transition at 210 nm in fused silica. Journal of Applied Physics 1994, 76, (5), 3063-7.
  • Roy, A. K.; Gleason, K. K., Application of proton multiple-quantum NMR to the study of dynamics in bulk chloral polycarbonate. Journal of Polymer Science, Part B: Polymer Physics 1994, 32, (13), 2235-40.
  • McNamara, K. M.; Gleason, K. K., Radial distribution of hydrogen in chemical vapor deposited diamond. Chemistry of Materials 1994, 6, (1), 39-43.
  • McNamara, K. M.; Williams, B. E.; Gleason, K. K.; Scruggs, B. E., Identification of defects and impurities in chemical-vapor-deposited diamond through infrared spectroscopy. Journal of Applied Physics 1994, 76, (4), 2466-72.
  • McNamara, K. M.; Scruggs, B. E.; Gleason, K. K., The effect of impurities on the IR absorption of chemically vapor deposited diamond. Thin Solid Films 1994, 253, (1-2), 157-61.
  • Lathrop, D. A.; Handy, E. S.; Gleason, K. K., Multiple-quantum NMR coherence growth in single-crystal and powdered calcium fluoride. Journal of Magnetic Resonance, Series A 1994, 111, (2), 161-8.
  • Wolden, C.; Gleason, K. K., Heterogeneous formation of atomic hydrogen in hot-filament diamond deposition. Applied Physics Letters 1993, 62, (19), 2329-31.
  • Scruggs, B. E.; Gleason, K. K., Analysis of fluorocarbon plasma-treated diamond powders by solid-state fluorine-19 nuclear magnetic resonance. Journal of Physical Chemistry 1993, 97, (36), 9187-95.
  • Mitra, S.; Gleason, K. K.; Jia, H.; Shinar, J., Effects of annealing on hydrogen microstructure in boron-doped and undoped rf-sputter-deposited amorphous silicon. Physical Review B 1993, 48, (4), 2175-82.
  • Mitra, S.; Gleason, K. K., Proton NMR studies on the effects of annealing on chemical-vapor-deposited (CVD) diamond. Diamond and Related Materials 1993, 2, (2-4), 126-9.
  • McNamara, K. M.; Gleason, K. K., Comparison of tantalum and rhenium filaments in diamond CVD using selective carbon-13 labeling. Journal of the Electrochemical Society 1993, 140, (2), L22-L24.
  • Limb, S. J.; Scruggs, B. E.; Gleason, K. K., Distribution and motion of trifluoromethanesulfonate anions in poly(p-hydroxystyrene) and polystyrene films studied by multiple-quantum NMR. Macromolecules 1993, 26, (15), 3750-7.
  • Limb, S. J.; Gleason, K. K.; Gleason, E. F.; DeVaney, L. P.; Edell, D. J., Characterizing plasma-polymerized fluorocarbon surfaces used in device passivation and fine wire coating. Polymer Preprints (American Chemical Society, Division of Polymer Chemistry) 1993, 34, (2), 100-1.
  • Levy, D. H.; Gleason, K. K., Nuclear magnetic resonance probe for low level hydrogen detection. Journal of Vacuum Science and Technology A 1993, 11, (1), 195-8. Levy, D. H.; Gleason, K. K., Proton nuclear magnetic resonance of thermally grown silicon dioxide films. Journal of the Electrochemical Society 1993, 140, (3), 797-800.
  • Levy, D. H.; Gleason, K. K.; Rothschild, M.; Sedlacek, J. H. C., The role of hydrogen in excimer-laser-induced damage of fused silica. Journal of Applied Physics 1993, 73, (6), 2809-15.
  • Lathrop, D. A.; Gleason, K. K., Effects of polymeric motion on fluorine-19 NMR multiple quantum coherences: signal refocusing in poly(tetrafluoroethylene). Macromolecules 1993, 26, (17), 4652-7.
  • Lathrop, D.; Gleason, K. K., Polymer dynamics studied by fluorine-19 multiple quantum coherences. Polymer Preprints (American Chemical Society, Division of Polymer Chemistry) 1993, 34, (1), 367-8.
  • Gleason, K. K., Creating multiple-quantum coherences in solids. Concepts in Magnetic Resonance 1993, 5, (3), 199-216.
  • Burum, D. P.; Cory, D. G.; Gleason, K. K.; Levy, D.; Bielecki, A., Quadrature detection of CRAMPS NMR data for maximum resolution and sensitivity. Journal of Magnetic Resonance, Series A 1993, 104, (3), 347-52.

Patents
  • 4. Gleason et al. Chemical vapor deposition of fluorocarbon polymer thin films. 2000, 6,156,435
  • 3. Gleason et al. Chemical vapor deposition of fluorocarbon polymer thin films. 2000, 6,153,269.
  • 2. Gleason et al. Pyrolytic chemical vapor deposition of silicone films. 2000, 6,045,877.
  • 1. Gleason et al. Chemical vapor deposition of fluorocarbon polymer thin films. 1999, 5,888,591.