Ion Beam Deposition Techniques
Larry Stelmack Alumnus, Gale S. Petrich
Wed Jan 17, Mon Jan 22, Tue Jan 23, Wed Jan 24, 01-03:00pm, 36-462
Enrollment limited: first come, first served
Limited to 50 participants.
Participants welcome at individual sessions (series)
Prereq: None
An introduction to ion beam (IB)deposition processes and their applications is presented. Ion bombardment effects in deposition of thin films are presented for IB cleaning, IB assisted deposition, and IB sputter deposition. Plasma generation and ion source operation will be discussed. Guidelines for optimizing coating yields and performance will be given. Contamination control procedures for IB processing will be discussed.
Contact: Larry Stelmack, (617) 335-9401, lstelmack@alum.mit.edu
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