Anodic, PAA, nanowire array, solid substrate
Filters, collimators, templates for nano-patterning and nanowire growth, photonic band gap material
Free standing anodic films cannot sustain stress.
This invention proposes a technology that allows for the fabrication of porous anodic alumina (PAA) films on a wide variety of substrates, including silicon. An additional advance over past PAAs in that it is more durable, and can be fabricated without a barrier layer between the film and substrate, allowing for nanowires to be electrochemically deposited into the honeycomb pattern of pores. This technique offers a unique, facile, and versatile approach for the incorporation of anodic alumina films or arrays of nanowires into a variety of environments and devices.
Allows for the fabrication of PAA films on a wide variety of substrates. PAA films can be grown on patterned and non-planar surface
US Patent Number 7,875,195 issued on January 25, 2011
Proceedings of the MRS Fall Meeting 2000, Dec. 22, 2000
MRS Fall Meeting 2000, Nov. 28, 2000
World intellectual property organization, 05/06/2003
Last revised: April 29, 2013