Self-assembly materials, block copolymer, nanolithography, polymer mask pattern, topographical control, substrate fabrication, interference lithography, antireflection layer post, photoresist pattern
Fabricating arrays of nanomagnets with out-of-plane magnetization; storage capacity of magnetic storage systems; single layer films of light-emitting quantum dots
The novel method described herein facilitates self-assembly of block copolymers (BCP) in thin films over ultra-large area substrates. The approach employs topography on the substrate to confine the block copolymer domains. At the core of the invention lies the basic idea that to control a two-dimensional periodic structure, a two-dimensional array of topographical constraints is needed. This is achieved through substrates comprising a plurality of guiding posts arrayed periodically in 2-D on or in the surface of the substrate, and materials capable of a periodic structure on the substrate that is commensurate with the BCP lattice.
The fabrication process for making substrates allows feature sizes in the sub-50 nm range with uniform control over post shape, size and spacing over ultra-large areas.
U.S. Patent filed September 26, 2008
Last revised:November 5, 2010
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