Graphene, transparent electrodes, conductive films, few layer graphene (FLG), electronic components
Composite materials, sensors, electronic devices, solar cells, LCD, LED
Fabrication process to obtain large area films on substrates in a controlled manner
This invention is a method to fabricate few-layer graphene (FLG) films on arbitrary substrates. This is implemented by chemical vapor deposition (CVD) growth of a FLG film on Ni and the subsequent transfer to any type of substrate. The high quality of the films is established by atomic force microscopy (AFM), transmission electron microscopy (TEM), Raman characterizations and electrical measurements. The findings suggest a new and cost-effective approach to fabricate graphene-based films, allowing their integration with other materials for future technological applications.
U.S. Patent Application Number 12/422747, filed on April 13, 2009
Last revised: January 19, 2012
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