Case 13136

Cost effective fabrication of large area single and few-layer graphene on arbitrary substrates


Graphene, transparent electrodes, conductive films, few layer graphene (FLG), electronic components


Composite materials, sensors, electronic devices, solar cells, LCD, LED


    Fabrication process to obtain large area films on substrates in a controlled manner


This invention is a method to fabricate few-layer graphene (FLG) films on arbitrary substrates. This is implemented by chemical vapor deposition (CVD) growth of a FLG film on Ni and the subsequent transfer to any type of substrate. The high quality of the films is established by atomic force microscopy (AFM), transmission electron microscopy (TEM), Raman characterizations and electrical measurements. The findings suggest a new and cost-effective approach to fabricate graphene-based films, allowing their integration with other materials for future technological applications.

  • Increases conductivity
  • Enhances mechanical stability
  • No limitation on graphene film size, only determined by Ni film substrate size (1-2 cm2)
  • Ambient pressure CVD

  • Professor Mildred Dresselhaus (Department of Physics and Electrical Engineering, MIT)
  • Professor Jing Kong (Department of Electrical Engineering and Computer Science, MIT)
  • Alfonso Reina Cecco (Department of Materials Science and Engineering, MIT)

Intellectual Property:

U.S. Patent Application Number 12/422747, filed on April 13, 2009



Last revised: January 19, 2012

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