Skills and Materials of the Integrated Photonic Devices and Materials Group
Personnel Topic Substrates EpiMaterials Processing Materials Processing Equipment Characterization Equipment Comments
Gale Petrich Research Staff Primary: GaAs, InP

Secondary: Si		 AlGaAs, InGaP, InGaAlP, InGaAsP, InP (All III-V Epilayers)
Molecular Beam Epitaxy, AlAs Oxidization Furnace

See Comment		 Variable Angle Spectroscopic Ellipsometry, Hall Measurements, Photoluminescence, Triple Axis Xray Diffraction, Reflectometry, Waveguide Optical Measurements Supervised EML when the laboratory was located in Bldg 13
Orit Shamir Optical Arbitrary Waveform Generator: Modulator at 800nm Primary: GaAs

Secondary: Si		 AlGaAs, InGaP, InGaAlP, InAlP PECVD SiO2,



OCG25, AZ5214,

TiPtAu, NiGeAu		 TRL: Suss MicroTec Aligner (KS2), EVG Aligner, Spinner, Wet Etching

NSL: SAMCO ICP RIE

EML:




Ta-Ming Shih Broad Area Photonic Crystals: SuperCollimator, Optical Logic Primary: InP

Secondary: SOI/Si		 InP, InGaAsP
 PECVD SiO2,





 TRL:

NSL:

EML:




Sheila Nabanja SBRs, InP-devices Primary: GaAs, InP

Secondary: 		GaAs, AlGaAs





AlAs Oxidation Furnace
TRL:

NSL:

EML:





Last update:
9/15/10