Chemical Vapor Deposition of Polymer Thin Films at The Massachusetts Institute of Technology
Equipment
Reactors
3 iCVD Reactors: Maximus, Pancake, Altus
3 oCVD Reactors: CJ, Lux, Neo
Roll to Roll Reactor, configurable for iCVD and oCVD
Additional Processing
- NTE-3500 Nano-Master Thermal Evaporator, Automatic Sputter Coater, Physical Vapor Deposition System
- Denton Sputter Coater and Etcher
- O2 or Ar Plasma Cleaner
Characterization
- J.A. Woollham Variable Angle Spectroscopic Ellipsometer
- Nicolet is50 Fourier Transform Infra-Red Spectrophotometer
- Hitachi TM3000 Scanning Electron Microscope equipped with Bruker Quantax 70 EDS
- Olympus DP21 Optical Microscope
- ADMET Micro EP Minature Testing Machine with Temperature Chamber
- CH Instruments 600D Electrochemical Analyzer/Workstation
- Zeta-20 Optical Profiler
- KP Technology SKP5050 Scanning Kelvin Probe System
- Agilent Technologies Gass Chromatograph 7890A
- Janel RM3 4 Probe
- Rame-Hart Model 250 Contact Angle Goniometer
- Nanovea Nanoindentor and Nanoscratcher
- Innovative Technology PureLab HE Glovebox
