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An Optimization Model for Diffusion in Semiconductor Manufacturing

Updated: 05-March-97

Student: Hemant Taneja
Companies: Analog Devices
Advisor: Professor Stephen C. Graves
Supervisor: Sumer Johal
Contact Info: (617)-225-9482
hemant@mit.edu
Organization: MIT Sloan School
Address: D326
450 Memorial Drive
Cambridge, MA 02139

Project Goals

The goal of the project is to develop an optimization model for diffusion processes in semiconductor fabs. This model determines optimal allocation of lots to maximize utlization of diffusion furnaces based on priority queues and processing times of the lots.

Project Progress

The model has been developed using MATLAB. Currently, simulations are being run on the model using real data on lots. This data will be compared to actual performance in the fab to assess the value of the model.

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