The Sawin Squad
Alumnae
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The Sawin Squad
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Alumnae |
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| Name | Degree/Year | Thesis Title |
|---|---|---|
| Bo Bai (Goldman Sachs & Co.) | Ph.D. Physics 2006 | An Experimental Study and Modeling of Transformer-Coupled Toroidal Plasma Processing of Materials [abstract] |
| Stacy A. Rasgon (McKinsey Co.) | Ph.D. Chem. Engr. 2004 | Origin, Evolution and Control of Sidewall Line Edge Roughness Transfer During Plasma Etching [abstract] |
| Ohseung Kwon (Hewlett Packard) | Sc.D. Mat. Sci.. 2004 | Surface Kinetics Modeling of Silicon Oxide Etching in Fluorcarbon Plasmas [abstract] |
| Weidong Jin (Goldman Sachs Co.) | Ph.D. Chem.Eng. 2003 | Study of Plasma-surface Kinetics and Feature Profile Simulation of Poly-silicon Etching in Cl2/HBr Plasma[abstract] |
| Frank L. Ross III (Novellus Syst. Inc.) | Ph.D. Mat. Sci. 2003 | Nano-cellular Microstructure Evolution in Ion-induced Chemical Vapor Deposition (II-CVD) of Copper[abstract] |
| Brian E. Goodlin (Texas Inst.) | Ph.D. Chem.Eng. 2002 | Multivariate Endpoint Detection of Plasma Etching Processes[abstract] |
| Steven A. Vitale (Texas Inst.) | Ph.D. Chem.Eng. 2001 | Characterization of Low Dielectric Constant Film Etching in High Density Halogen Plasmas[abstract] |
| Brett A. Cruden (NASA-Ames) | Ph.D. Chem.Eng. 2000 | Chemical Vapor Deposition of Fluorocarbon Films for Low Dielectric Constant Interlayer Dielectric Applications [abstract] |
| Heeyeop Chae (Prof. Sungkyunkwan U.) | Ph.D. Chem.Eng. 2000 | Plasma Chemical Kinetics of Silicon Dioxide Etching with Fluorocarbon Compounds [abstract] |
| Y-P. Han | Ph.D. Chem.Eng. 1999 | HF Vapor Etching and Cleaning of Silicon Wafer Surfaces [abstract] |
| Arpan P. Mahorowala (IBM-Watson) | Ph.D. Chem.Eng. 1998 | Feature Profile Evolution during the High Density Plasma Etching of Polysilicon |
| Jane Pei-chen Chang (Prof. UCLA) | Ph.D. Chem.Eng. 1997 | Study of Plasma-Surface Kinetics and Simulation of Feature Profile Evolution in Chlorine Etching of Patterned Polysilicon |
| A. Scott Lawing (Rodel Inc.) | Ph.D. Chem.Eng. 1997 | Gas-Phase Cleaning of Silicon Wafer Surfaces |
| Minh S. Le (Vitesse Corp.) | M.S. Elec..Eng. 1997 | Variation Reduction in Plasma Etching via Run-to-run Process Control and Endpoint Detection |
| Gilbert L. Huppert (Appl. Mater. Corp.) | Ph.D. Chem.Eng. 1996 | Two-Dimensional Simulation of RF Glow Discharges |
| Vivek Mohindra (Dell Computer Corp.) | Ph.D. Chem.Eng. 1996 | Characterization of Perfluorocompound Emission and Abatement Kinetics in Plasma Processes |
| Tony P. Chiang (Novellus Syst. Inc.) | Ph.D. Mat.Sci. 1996 | Surface Kinetic Study of Ion Induced Chemical Vapor Deposition of Copper |
| John C. Arnold (IBM-Watson) | Ph.D. Chem.Eng. 1995 | Material Transport and Reaction Effects in Surface Topography Evolution During Plasma Etching |
| Gerald W. Gibson Jr. (IBM-Watson) | Ph.D. Chem.Eng. 1994 | Radial Ion Transport in a Limited Axisymmetric ECR Plasma |
| Timothy J. Dalton (IBM-Watson) | Ph.D. Chem.Eng. 1994 | Pattern Dependencies in the Plasma Etching of Polysilicon |
| David C. Gray | Ph.D. Chem.Eng. 1992 | Beam Simulation Studies of Plasma-surface Interactions in Fluorocarbon Etching of Si and SiO2 |
| Igor Tepermeister (Leybold Corp.) | Ph.D. Chem.Eng. 1992 | Study of Plasma-polymer Surface Interactions in Fluorine and Oxygen Discharges |
| Joanne Liu (Cabot Corp.) | Ph.D. Chem.Eng. 1993 | Scaling Relationships for Power Deposition and Ion Bombardment in RF Plasmas |
| Linda L.D.B. Kiss (Raychem Corp.) | Ph.D. Chem.Eng. 1991 | Study of Plasma Chemical Kinetics by Modulated Power Relaxation |
| Jeffrey W. Butterbaugh (FSI Inter. Inc.) | Ph.D. Chem. Eng. 1990 | Characterization and Modeling of Silicon Dioxide Etching in Tetrafluoromethane RF Glow Discharges |
| Evangelos Gogolides (Greek Inst. of Microelect.) | Ph.D. Chem.Eng. 1990 | Self-consistent Continuum Modeling of RF Glow Discharges |
| Subodh Kulkarni (3M Corp.) | Ph.D. Chem.Eng. 1989 | Kinetics and Mechanisms of Disilane Decomposition on Silicon |
| Evangelos Gogolides (Greek Inst.of Microelect.) | S.M. Chem.Eng. 1987 | Characterization of n+ Polysilicon Etching in CCl4/He Discharges |
| Jeffrey P. Schwartz | Sc.D.. Chem.Eng. 1987 | The Kinetic Mechanism of Silicon Etching by Molecular Chlorine at Elevated Temperatures |
| Rebecca A. Rossen | Ph.D. Chem.Eng. 1987 | A Molecular Beam Study of Ion-Enhanced Gas-Surface Kinetics: the Si/Cl2/Ar+ System |
| Albert D. Richards | Sc.D. Chem. Eng. 1986 | Characterization and Modeling of Polysilicon Etching in a Chlorine Plasma |
| Kenneth D. Allen | Ph.D. Chem.Eng. 1986 | Modeling of the Plasma Etching of Polysilicon with Chloro- and Bromo-Trifluoromethane Discharges |
| Brian E. Thompson | Ph.D. Chem. Eng. 1986 | Characterization and Modeling of Sulfur Hexafluoride RF Glow-Discharges for Etching Polysilicon |
| Linda E. Gouse | Sc.D. Chem.Eng. 1983 | Kinetics and Mechanism of the Oxidation of Carbon Monoxide over a Platinum Catalyst |