Machines by Location: 2F 4-South Diffusion
| Process | Lab | Tool | Process Category | Subcategory | Description | |
|---|---|---|---|---|---|---|
| ICL | DCVD | Deposition | PECVD | PECVD deposition of oxides, nitrides, and a-Si | ||
| ICL | rca-ICL | Diffusion | Clean | Wafer cleaning before diffusion tubes | ||
| ICL | RTA2 | Diffusion | Bake | Rapid Thermal Annealing | ||
| ICL | RTA-pieces | Diffusion | Bake | Rapid Thermal Annealing | ||
| ICL | RTP | Diffusion | Bake | Rapid Thermal Annealing | ||
| ICL | RTP-Si | Diffusion | Bake | Rapid Thermal Annealing |