Machines by Subcategory: Clean
| Process | Lab | Tool | Process Category | Subcategory | Description | |
|---|---|---|---|---|---|---|
| EML | asher-EML | Photo | Clean | Oxygen Plasma | ||
| ICL | asher-ICL | Photo | Clean | Single wafer oxygen plasma for photoresist removal | ||
| ICL | rca-ICL | Diffusion | Clean | Wafer cleaning before diffusion tubes | ||
| MTL | Procedures-Cleaning | Procedures | Clean | Sample Cleaning | ||
| TRL | asherMatrix-TRL | Photo | Clean | Single wafer oxygen plasma for photoresist removal | ||
| TRL | asher-TRL | Photo | Clean | Barrel asher for resist removal | ||
| TRL | rca-TRL | Diffusion | Clean | Wafer cleaning before diffusion tubes | ||
| TRL | UVozone-Au | Etch | Clean | Cleans residual organics | ||
| LEAP | PlasmaCleaner | Packaging | Clean | Plasma parts cleaning |