My Process:

Machines by Subcategory: Clean

Removes residue and contaminants, can involve acids, solvents, or plasma
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ProcessLabToolProcess CategorySubcategoryDescription
Color Code
  +  
EML asher-EML PhotoClean Oxygen Plasma
EML
  +  
ICL asher-ICL PhotoClean Single wafer oxygen plasma for photoresist removal
Green
  +  
ICL rca-ICL DiffusionClean Wafer cleaning before diffusion tubes
Green
MTL Procedures-Cleaning ProceduresClean Sample Cleaning
Red &Green
  +  
TRL asherMatrix-TRL PhotoClean Single wafer oxygen plasma for photoresist removal
Red
  +  
TRL asher-TRL PhotoClean Barrel asher for resist removal
Red &Green
  +  
TRL rca-TRL DiffusionClean Wafer cleaning before diffusion tubes
Green
  +  
TRL UVozone-Au EtchClean Cleans residual organics
Red
  +  
LEAP PlasmaCleaner PackagingClean Plasma parts cleaning
Red