Equipment
| Lab and Coral Name | EML / asher-EML |
| Model | 0 |
| Specialist | Kurt Broderick (Timothy Turner, Gary Riggott) |
| Physical Location | 5F 2-North |
Classification
| Process Category | Photo |
| Subcategory | Clean |
| Material Keywords | Polyimide, Other Polymers, Photoresist, EBL Resist |
| Sample Size | 4" Wafers, Pieces |
| Alternative | none |
| Keywords | single wafer, multiple pieces, both sides of sample, isotropic etch, vacuum, plasma, manual operation |
Description
The asher-EML is a barrel plasma photoresist stripper.
| Best for | |
| Limitations | |
| Characteristics/FOM | |
| Caution with | |
| Machine Charges | 2/run |
Documents
SOP
| Asher | SOP for the barrel asher |
| Resist Recipes | Baseline resist recipes for TRL |
External Links
| Guide | MicroChem Application Notes |
Process Matrix Details
PTC Matrix does not apply for EML
Ever been in EMLSamples from EML are never permitted to return to ICL or TRL