Machines by Material Keyword: EBL Resist
Process | Lab | Tool | Process Category | Subcategory | Description | |
---|---|---|---|---|---|---|
EBL | Elionix | Photo | Expose | Electron beam lithography system | ||
EML | acid-hood-EML | Wet | Solvents | General Purpose Acid Fume-Hood | ||
EML | asher-EML | Photo | Clean | Oxygen Plasma | ||
EML | coater-EML | Photo | Coat | Photoresist Coater | ||
EML | eBeam-AJA | Deposition | Evaporate | Metal and dielectric evaporator | ||
EML | filmetrics | Metrology | Thickness | Thin Film Optical Measurement | ||
EML | photo-hood-EML | Wet | Solvents | Solvent Fume hood for lithography | ||
EML | SolventHood-EML | Wet | Solvents | Solvent Fume hood for lithography | ||
ICL | asher-ICL | Photo | Clean | Single wafer oxygen plasma for photoresist removal | ||
ICL | eBeam-EVO | Deposition | Evaporate | Metal evaporator of CMOS compatible metals | ||
ICL | premetal-Piranha | Wet | Acids | Piranha resist removal and cleaning station | ||
ICL | UV1280 | Metrology | Thickness | Thin film characterization | ||
MTL | Procedures-Cleaning | Procedures | Clean | Sample Cleaning | ||
MTL | Procedures-General | Procedures | General | Broader concepts | ||
MTL | Procedures-Lithography | Procedures | Photo | Lithography | ||
TRL | asherMatrix-TRL | Photo | Clean | Single wafer oxygen plasma for photoresist removal | ||
TRL | asher-TRL | Photo | Clean | Barrel asher for resist removal | ||
TRL | coater | Photo | Coat | Manual spin-coater for photoresists | ||
TRL | eBeamAu | Deposition | Evaporate | Metal evaporator | ||
TRL | eBeamFP | Deposition | Evaporate | Fast pumping metal evaporator | ||
TRL | ellipsometer-TRL | Metrology | Thickness | Thin film thickness measurement | ||
TRL | Filmetrics-TRL | Metrology | Thickness | Thin film thickness measurement | ||
TRL | hotplate1 | Photo | Bake | Hotplate for lithography | ||
TRL | hotplate2 | Photo | Bake | Hotplate for lithography | ||
TRL | hotplate300 | Photo | Bake | Hotplate for lithography | ||
TRL | nanospec | Metrology | Thickness | Thin film thickness measurement | ||
TRL | photo-wet-Au | Wet | Solvents | Solvent fume hood with sonicator | ||
TRL | photo-wet-l | Wet | Solvents | Wetbench for photoresist development | ||
TRL | photo-wet-r | Wet | Solvents | Wetbench for photoresist development | ||
TRL | PMMAspinner | Photo | Coat | Manual coater for PMMA and other photoresists | ||
TRL | SolventHood-TRL | Wet | Solvents | Solvent fume hood | ||
TRL | varTemp | Photo | Bake | Bake oven for variable temperature |