Equipment
| Lab and Coral Name | EML / photo-hood-EML |
| Model | 0 |
| Specialist | Kurt Broderick (Timothy Turner, Gary Riggott) |
| Physical Location | 5F 1-South Photo |
Classification
| Process Category | Wet |
| Subcategory | Solvents |
| Material Keywords | Polyimide, SU8, Other Polymers, Photoresist, EBL Resist, Developer, Solvents |
| Sample Size | 6" Wafers, 4" Wafers, 7" Photo Plates, 5" Photo Plates, Pieces |
| Alternative | ? |
| Keywords | single wafer, manual load, multiple pieces, both sides of sample, isotropic etch, manual operation |
Description
The photo-hood-EML is a fume hood that solvent wet etch
| Best for | |
| Limitations | |
| Characteristics/FOM | |
| Caution with | |
| Machine Charges | 8/run |
Documents
SOP
| Wet Processing | Rules and guidelines for wet processing |
Documents
| Etch rates part 2 | Berkeley etch rate paper |
Process Matrix Details
PTC Matrix does not apply for EML
Ever been in EMLSamples from EML are never permitted to return to ICL or TRL