Machines by General Keyword: both sides of sample
Process | Lab | Tool | Process Category | Subcategory | Description | |
---|---|---|---|---|---|---|
EML | acid-hood-EML | Wet | Solvents | General Purpose Acid Fume-Hood | ||
EML | asher-EML | Photo | Clean | Oxygen Plasma | ||
EML | hotpress | Photo | Bond | Pressing for thermoplastic films | ||
EML | photo-hood-EML | Wet | Solvents | Solvent Fume hood for lithography | ||
EML | SolventHood-EML | Wet | Solvents | Solvent Fume hood for lithography | ||
TRL | 2Dtransfer-platingHood | Wet | Acids | Electroplating wet bench and fume hood | ||
ICL | 5A-GateOx | Diffusion | Oxidation | Diffusion tube for gate oxide growth | ||
ICL | 5B-Anneal | Diffusion | Bake | Annealing tube | ||
ICL | 5C-FieldOx | Diffusion | Oxidation | Diffusion tube for wet oxide growth of thicker films | ||
ICL | 5D-ThickOx | Diffusion | Oxidation | Diffusion tube for wet oxide growth of thicker films | ||
ICL | 6A-nPoly | Diffusion | CVD | Polysilicon deposition tube for n-type poly Si | ||
ICL | 6B-Poly | Diffusion | CVD | Polysilicon deposition tube for p-type poly Si | ||
ICL | 6C-LTO | Diffusion | CVD | Low temperature CVD oxide deposition | ||
ICL | 6D-Nitride | Diffusion | CVD | Deposition of stoichiometric silicon nitride | ||
ICL | nitrEtch-HotPhos | Wet | Acids | Hot phosphoric nitride etch bath | ||
ICL | oxEtch-BOE | Wet | Acids | Silicon dioxide etch bath | ||
ICL | premetal-Piranha | Wet | Acids | Piranha resist removal and cleaning station | ||
ICL | rca-ICL | Diffusion | Clean | Wafer cleaning before diffusion tubes | ||
ICL | TMAH-KOHhood | Wet | Acids | Silicon bulk wet etching | ||
ICL | VTR | Diffusion | CVD | Low stress silicon nitride deposition | ||
TRL | A1-GateOx | Diffusion | Oxidation | Thermal Oxidation for Green Silicon Wafers | ||
TRL | A2-WetOxBond | Diffusion | Oxidation | Thermal Oxidation and other thermal process for GREEN Si wafers | ||
TRL | A3-Sinter | Diffusion | Bake | Sintering for GREEN Si wafers | ||
TRL | A4-III-Vanneal | Diffusion | Bake | Annealing for GREEN III-V samples | ||
TRL | acid-hood | Wet | Acids | Acid processing station | ||
TRL | asher-TRL | Photo | Clean | Barrel asher for resist removal | ||
TRL | B1-Au | Diffusion | Oxidation | Gold compatible anneal tube | ||
TRL | B2-Ox-alloy-Poly | Diffusion | Oxidation | Thermal Oxidation and LPCVD Polysilicon for RED wafers | ||
TRL | B3-DryOx | Diffusion | Oxidation | Thermal Oxidation | ||
TRL | B4-Poly | Diffusion | CVD | LPCVD polysilicon for Green wafers | ||
TRL | FLX | Metrology | Profile | Thin film stress measurement | ||
TRL | Greenflo | Wet | Acids | Acid processing station | ||
TRL | HMDS-TRL | Photo | Bake | HMDS oven | ||
TRL | photo-wet-Au | Wet | Solvents | Solvent fume hood with sonicator | ||
TRL | photo-wet-l | Wet | Solvents | Wetbench for photoresist development | ||
TRL | photo-wet-r | Wet | Solvents | Wetbench for photoresist development | ||
TRL | postbake | Photo | Bake | Bake oven 120C | ||
TRL | prebakeovn | Photo | Bake | Bake oven 90C | ||
TRL | PZTfurnace | Deposition | Bake | Bake oven for PZT coated wafers | ||
TRL | rca-TRL | Diffusion | Clean | Wafer cleaning before diffusion tubes | ||
TRL | SolventHood-TRL | Wet | Solvents | Solvent fume hood | ||
TRL | varTemp | Photo | Bake | Bake oven for variable temperature |