Wet processing covers either the use of solvents and photoresist developers, or the use of corrosive chemicals for sample cleaning or etching of materials. Each wet station has a very dedicated purpose. Acid- and solvent work is physically separated, and must not be mixed (dangerous). The range of tools in TRL, however, can be confusing at first: some tools are equivalent (e.g. acid-hood and Greenflo), while others are physically in the same location but used for slightly different purposes (photo-wet-l for developing, and photo-wet-r for solvent work).

The proper choice of beaker types is very important (e.g. most acids use glass beakers, but HF requires plastic). Safety procedures for both acid and solvent work is important. Solvents have a special waste stream. Acid hoods have aspirators. Many helpful and important details are found in the safety sections of the SOP, and it is vital to follow these - to protect yourself and other users.

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Process	Lab	Tool	Subcategory	Description	Color Code
+	EML	acid-hood-EML	Solvents	General Purpose Acid Fume-Hood	EML
+	EML	photo-hood-EML	Solvents	Solvent Fume hood for lithography	EML
+	EML	SolventHood-EML	Solvents	Solvent Fume hood for lithography	EML
+	TRL	2Dtransfer-platingHood	Acids	Electroplating wet bench and fume hood	Red
+	ICL	GnP	Other	Chemical Mechanical Polishing to planarize surfaces	Red &Green
+	ICL	nitrEtch-HotPhos	Acids	Hot phosphoric nitride etch bath	Green
+	ICL	oxEtch-BOE	Acids	Silicon dioxide etch bath	Green
+	ICL	premetal-Piranha	Acids	Piranha resist removal and cleaning station	Green
+	ICL	TMAH-KOHhood	Acids	Silicon bulk wet etching	Red &Green
+	TRL	acid-hood	Acids	Acid processing station	Red &Green
+	TRL	Greenflo	Acids	Acid processing station	Red &Green
+	TRL	photo-wet-Au	Solvents	Solvent fume hood with sonicator	Red &Green
+	TRL	photo-wet-l	Solvents	Wetbench for photoresist development	Red &Green
+	TRL	photo-wet-r	Solvents	Wetbench for photoresist development	Red &Green
+	TRL	SolventHood-TRL	Solvents	Solvent fume hood	Red &Green