Machines by Sample Size: Pieces
Process | Lab | Tool | Keywords | 0 | Description | |
---|---|---|---|---|---|---|
EBL | Elionix | ERRORERROR | Electron beam lithography system | |||
EML | acid-hood-EML | ERRORERROR | General Purpose Acid Fume-Hood | |||
EML | ALD-EML | ERRORERROR | Atomic Layer Deposition | |||
EML | anneal-furnace | ERRORERROR | Anneal Furnace | |||
EML | asher-EML | ERRORERROR | Oxygen Plasma | |||
EML | BalzerSputterer | ERRORERROR | Thin sputter coating of samples | |||
EML | Box-Furnace | ERRORERROR | Anneal Furnace | |||
EML | coater-EML | ERRORERROR | Photoresist Coater | |||
EML | dektak-EML | ERRORERROR | Surface Profilerometer | |||
EML | eBeam-AJA | ERRORERROR | Metal and dielectric evaporator | |||
EML | filmetrics | ERRORERROR | Thin Film Optical Measurement | |||
EML | hotpress | ERRORERROR | Pressing for thermoplastic films | |||
EML | MA-4 | ERRORERROR | Contact Lithography Mask Aligner | |||
EML | OxidationTube | ERRORERROR | Oxidation Furnace | |||
EML | parametric-tester | ERRORERROR | Probe station for electrical measurements | |||
EML | photo-hood-EML | ERRORERROR | Solvent Fume hood for lithography | |||
EML | plasmatherm | ERRORERROR | Plasma Etch and Deposition | |||
EML | RTA-EML | ERRORERROR | Rapid Thermal Annealing | |||
EML | semNeo | ERRORERROR | Very Basic Electron Microscope | |||
EML | SolventHood-EML | ERRORERROR | Solvent Fume hood for lithography | |||
EML | SputtererAJA | ERRORERROR | Sputter deposition tool | |||
EML | vac-oven | ERRORERROR | Temperature controlled vacuum oven | |||
TRL | 2Dtransfer-platingHood | ERRORERROR | Electroplating wet bench and fume hood | |||
ICL | AFM | ERRORERROR | Atomic Force Microscope for Surface Analysis | |||
ICL | ALD | ERRORERROR | Atomic Layer Deposition | |||
ICL | ALD-Oxford | ERRORERROR | Atomic Layer Deposition | |||
ICL | diesaw | ERRORERROR | Wafer dicing saw | |||
ICL | diesaw-3240 | ERRORERROR | Wafer dicing saw | |||
ICL | eBeam-EVO | ERRORERROR | Metal evaporator of CMOS compatible metals | |||
ICL | goldwire | ERRORERROR | Gold ball bonder for device packaging | |||
ICL | Oxford-100_PECVD | ERRORERROR | Dual chamber PECVD and plasma etch tool | |||
ICL | Oxford-100_Etch | ERRORERROR | Dual chamber PECVD and plasma etch tool | |||
ICL | semZeiss | ERRORERROR | Scanning Electron Microscope | |||
ICL | TMAH-KOHhood | ERRORERROR | Silicon bulk wet etching | |||
ICL | wykoICL | ERRORERROR | Optical profiling system | |||
TRL | acid-hood | ERRORERROR | Acid processing station | |||
TRL | AJA-TRL | ERRORERROR | Sputter deposition tool | |||
TRL | asher-TRL | ERRORERROR | Barrel asher for resist removal | |||
TRL | Balzer-Elionix | ERRORERROR | SEM or EBL sample preparation | |||
TRL | CCNT | ERRORERROR | Carbon nanotube growth | |||
TRL | coater | ERRORERROR | Manual spin-coater for photoresists | |||
TRL | dek-NoAu | ERRORERROR | Stylus Profilerometer | |||
TRL | dektak-XT | ERRORERROR | Stylus Profilerometer | |||
TRL | eBeamAu | ERRORERROR | Metal evaporator | |||
TRL | eBeamFP | ERRORERROR | Fast pumping metal evaporator | |||
TRL | ellipsometer-TRL | ERRORERROR | Thin film thickness measurement | |||
TRL | EV1 | ERRORERROR | Contact mask aligner | |||
TRL | EV501 | ERRORERROR | Bonder system to apply heat, vacuum and pressure | |||
TRL | EV620 | ERRORERROR | Aligner for bonding | |||
TRL | EV-LC | ERRORERROR | Contact mask aligner | |||
TRL | Filmetrics-TRL | ERRORERROR | Thin film thickness measurement | |||
TRL | Greenflo | ERRORERROR | Acid processing station | |||
TRL | Hall-probe | ERRORERROR | Carrier measurement | |||
TRL | Heidelberg | ERRORERROR | Laser direct-write exposure for wafers and masks | |||
TRL | HMDS-TRL | ERRORERROR | HMDS oven | |||
TRL | hotplate1 | ERRORERROR | Hotplate for lithography | |||
TRL | hotplate2 | ERRORERROR | Hotplate for lithography | |||
TRL | hotplate300 | ERRORERROR | Hotplate for lithography | |||
TRL | IV-probe | ERRORERROR | Probe station with curve tracer for IV measurement | |||
TRL | MA-6 | ERRORERROR | Contact mask aligner | |||
TRL | MLA-150 | ERRORERROR | Direct-write lithography for wafers and larger pieces | |||
TRL | nanospec | ERRORERROR | Thin film thickness measurement | |||
TRL | OAI-Flood | ERRORERROR | Flood exposure for image reversal resists | |||
TRL | parylene | ERRORERROR | Parylene depopsition | |||
TRL | photo-wet-Au | ERRORERROR | Solvent fume hood with sonicator | |||
TRL | photo-wet-l | ERRORERROR | Wetbench for photoresist development | |||
TRL | photo-wet-r | ERRORERROR | Wetbench for photoresist development | |||
TRL | plasmaquest | ERRORERROR | Fluorine and Chlorine general purpose plasma deposition and etch tool | |||
TRL | PMMAspinner | ERRORERROR | Manual coater for PMMA and other photoresists | |||
TRL | postbake | ERRORERROR | Bake oven 120C | |||
TRL | prebakeovn | ERRORERROR | Bake oven 90C | |||
TRL | PZTcoater | ERRORERROR | Coater to apply PZT films | |||
TRL | PZTfurnace | ERRORERROR | Bake oven for PZT coated wafers | |||
TRL | Resonetics | ERRORERROR | Laser ablation system | |||
TRL | RTA-HiT | ERRORERROR | Rapid Thermal Annealing | |||
TRL | SAMCO | ERRORERROR | Chlorine based plasma etcher for III-V materials | |||
TRL | SolventHood-TRL | ERRORERROR | Solvent fume hood | |||
TRL | sts-CVD | ERRORERROR | PECVD deposition of oxides, nitrides, a-Si, SiC, and P-doped a-Si | |||
TRL | SU8spinner | ERRORERROR | Manual spin-coater for SU8 resists | |||
TRL | TBM-8 | ERRORERROR | Front-to-back alignement measurement | |||
TRL | UVozone-Au | ERRORERROR | Cleans residual organics | |||
TRL | varTemp | ERRORERROR | Bake oven for variable temperature | |||
TRL | WYKO | ERRORERROR | Optical profiling system | |||
TRL | XeF2 | ERRORERROR | XeF2 isotropic etching of silicon | |||
LEAP | AutoBonder | ERRORERROR | Automated wirebonder | |||
LEAP | BallBonder | ERRORERROR | Manual ball bonder | |||
LEAP | WedgeBonder | ERRORERROR | Manual wedge bonder | |||
LEAP | X-rayInspection | ERRORERROR | X-Ray imaging | |||
LEAP | DieBonder | ERRORERROR | Automated pick and place | |||
LEAP | PlasmaCleaner | ERRORERROR | Plasma parts cleaning | |||
LEAP | ReflowOven | ERRORERROR | Reflow oven | |||
LEAP | QuickVisionMicroscope | ERRORERROR | Automated imaging microscope |