Equipment
| Lab and Coral Name | EML / MA-4 |
| Model | Karl Suss MA-4 |
| Specialist | Kurt Broderick (Timothy Turner, Gary Riggott) |
| Physical Location | TBD |
Classification
| Process Category | Photo |
| Subcategory | Expose |
| Material Keywords | Polyimide, SU8, Other Polymers, Photoresist |
| Sample Size | 4" Wafers, Pieces |
| Alternative | TRL / MA-6 |
| Keywords | single wafer, manual load, top side of sample, manual operation, alignment |
Description
The MA-4 provides contact alignment photolithography exposure using a 365nm light source. A split field revolving microscope with 3.5x, 10x, and 25x objectives, and 10x binocular eyepieces objectives as well as X, Y, and theta micrometers are available to assist with manual wafer to mask alignment. Soft and hard contact modes are available as well as multi-exposure to prevent photoresist burning. Accepts glass masks and mylar transparencies.
| Best for | Experimental materials & short-loop testing, Initial photolithography training |
| Limitations | |
| Characteristics/FOM | 9-10 mW/cm2 365nm source, 1um SPR700 exposure: 12 seconds |
| Caution with | |
| Machine Charges | 6/wafer |
Documents
SOP
| MA-4 | SOP for the MA-4 mask aligner |
| Resist Recipes | Baseline resist recipes for TRL |
External Links
| Guide | MicroChem Application Notes |
Process Matrix Details
PTC Matrix does not apply for EML
Ever been in EMLSamples from EML are never permitted to return to ICL or TRL