Machines by General Keyword: alignment
| Process | Lab | Tool | Process Category | Subcategory | Description | |
|---|---|---|---|---|---|---|
| EBL | Elionix | Photo | Expose | Electron beam lithography system | ||
| EML | dektak-EML | Metrology | Profile | Surface Profilerometer | ||
| EML | filmetrics | Metrology | Thickness | Thin Film Optical Measurement | ||
| EML | hotpress | Photo | Bond | Pressing for thermoplastic films | ||
| EML | MA-4 | Photo | Expose | Contact Lithography Mask Aligner | ||
| EML | parametric-tester | Metrology | Electrical | Probe station for electrical measurements | ||
| EML | semNeo | Metrology | SEM | Very Basic Electron Microscope | ||
| ICL | 4-pt-probe | Metrology | Electrical | Sheet resistance measurement of semiconductors | ||
| ICL | AFM | Metrology | Profile | Atomic Force Microscope for Surface Analysis | ||
| ICL | cv | Metrology | Electrical | Electrical characterization of dielectrics | ||
| ICL | diesaw | Packaging | Physical | Wafer dicing saw | ||
| ICL | diesaw-3240 | Packaging | Physical | Wafer dicing saw | ||
| ICL | goldwire | Packaging | Physical | Gold ball bonder for device packaging | ||
| ICL | i-stepper | Photo | Expose | i-line stepper | ||
| ICL | P10 | Metrology | Profile | Stylus profilerometer | ||
| ICL | semZeiss | Metrology | SEM | Scanning Electron Microscope | ||
| ICL | UV1280 | Metrology | Thickness | Thin film characterization | ||
| TRL | dek-NoAu | Metrology | Profile | Stylus Profilerometer | ||
| TRL | dektak-XT | Metrology | Profile | Stylus Profilerometer | ||
| TRL | ellipsometer-TRL | Metrology | Thickness | Thin film thickness measurement | ||
| TRL | EV1 | Photo | Expose | Contact mask aligner | ||
| TRL | EV501 | Photo | Bond | Bonder system to apply heat, vacuum and pressure | ||
| TRL | EV620 | Photo | Bond | Aligner for bonding | ||
| TRL | EV-LC | Photo | Expose | Contact mask aligner | ||
| TRL | Filmetrics-TRL | Metrology | Thickness | Thin film thickness measurement | ||
| TRL | FLX | Metrology | Profile | Thin film stress measurement | ||
| TRL | Hall-probe | Metrology | Electrical | Carrier measurement | ||
| TRL | Heidelberg | Photo | Expose | Laser direct-write exposure for wafers and masks | ||
| TRL | IV-probe | Metrology | Electrical | Probe station with curve tracer for IV measurement | ||
| TRL | MA-6 | Photo | Expose | Contact mask aligner | ||
| TRL | MLA-150 | Photo | Expose | Direct-write lithography for wafers and larger pieces | ||
| TRL | nanospec | Metrology | Thickness | Thin film thickness measurement | ||
| TRL | Resonetics | Photo | Expose | Laser ablation system | ||
| TRL | TBM-8 | Photo | Bond | Front-to-back alignement measurement | ||
| LEAP | AutoBonder | Packaging | Physical | Automated wirebonder | ||
| LEAP | DieBonder | Packaging | Physical | Automated pick and place | ||
| LEAP | QuickVisionMicroscope | Packaging | Physical | Automated imaging microscope |