Machines by General Keyword: alignment
Process | Lab | Tool | Process Category | Subcategory | Description | |
---|---|---|---|---|---|---|
EBL | Elionix | Photo | Expose | Electron beam lithography system | ||
EML | dektak-EML | Metrology | Profile | Surface Profilerometer | ||
EML | filmetrics | Metrology | Thickness | Thin Film Optical Measurement | ||
EML | hotpress | Photo | Bond | Pressing for thermoplastic films | ||
EML | MA-4 | Photo | Expose | Contact Lithography Mask Aligner | ||
EML | parametric-tester | Metrology | Electrical | Probe station for electrical measurements | ||
EML | semNeo | Metrology | SEM | Very Basic Electron Microscope | ||
ICL | 4-pt-probe | Metrology | Electrical | Sheet resistance measurement of semiconductors | ||
ICL | AFM | Metrology | Profile | Atomic Force Microscope for Surface Analysis | ||
ICL | cv | Metrology | Electrical | Electrical characterization of dielectrics | ||
ICL | diesaw | Packaging | Physical | Wafer dicing saw | ||
ICL | diesaw-3240 | Packaging | Physical | Wafer dicing saw | ||
ICL | goldwire | Packaging | Physical | Gold ball bonder for device packaging | ||
ICL | i-stepper | Photo | Expose | i-line stepper | ||
ICL | P10 | Metrology | Profile | Stylus profilerometer | ||
ICL | semZeiss | Metrology | SEM | Scanning Electron Microscope | ||
ICL | UV1280 | Metrology | Thickness | Thin film characterization | ||
TRL | dek-NoAu | Metrology | Profile | Stylus Profilerometer | ||
TRL | dektak-XT | Metrology | Profile | Stylus Profilerometer | ||
TRL | ellipsometer-TRL | Metrology | Thickness | Thin film thickness measurement | ||
TRL | EV1 | Photo | Expose | Contact mask aligner | ||
TRL | EV501 | Photo | Bond | Bonder system to apply heat, vacuum and pressure | ||
TRL | EV620 | Photo | Bond | Aligner for bonding | ||
TRL | EV-LC | Photo | Expose | Contact mask aligner | ||
TRL | Filmetrics-TRL | Metrology | Thickness | Thin film thickness measurement | ||
TRL | FLX | Metrology | Profile | Thin film stress measurement | ||
TRL | Hall-probe | Metrology | Electrical | Carrier measurement | ||
TRL | Heidelberg | Photo | Expose | Laser direct-write exposure for wafers and masks | ||
TRL | IV-probe | Metrology | Electrical | Probe station with curve tracer for IV measurement | ||
TRL | MA-6 | Photo | Expose | Contact mask aligner | ||
TRL | MLA-150 | Photo | Expose | Direct-write lithography for wafers and larger pieces | ||
TRL | nanospec | Metrology | Thickness | Thin film thickness measurement | ||
TRL | Resonetics | Photo | Expose | Laser ablation system | ||
TRL | TBM-8 | Photo | Bond | Front-to-back alignement measurement | ||
LEAP | AutoBonder | Packaging | Physical | Automated wirebonder | ||
LEAP | DieBonder | Packaging | Physical | Automated pick and place | ||
LEAP | QuickVisionMicroscope | Packaging | Physical | Automated imaging microscope |