Machines by Subcategory: Expose
| Process | Lab | Tool | Process Category | Subcategory | Description | |
|---|---|---|---|---|---|---|
| EBL | Elionix | Photo | Expose | Electron beam lithography system | ||
| EML | MA-4 | Photo | Expose | Contact Lithography Mask Aligner | ||
| ICL | i-stepper | Photo | Expose | i-line stepper | ||
| TRL | EV1 | Photo | Expose | Contact mask aligner | ||
| TRL | EV-LC | Photo | Expose | Contact mask aligner | ||
| TRL | Heidelberg | Photo | Expose | Laser direct-write exposure for wafers and masks | ||
| TRL | MA-6 | Photo | Expose | Contact mask aligner | ||
| TRL | MLA-150 | Photo | Expose | Direct-write lithography for wafers and larger pieces | ||
| TRL | OAI-Flood | Photo | Expose | Flood exposure for image reversal resists | ||
| TRL | Resonetics | Photo | Expose | Laser ablation system |