Equipment
| Lab and Coral Name | EML / filmetrics |
| Model | Filmetrics F20 |
| Specialist | Kurt Broderick (Timothy Turner, Gary Riggott) |
| Physical Location | TBD |
Classification
| Process Category | Metrology |
| Subcategory | Thickness |
| Material Keywords | SiO2, SiNx, Dielectrics, Non-Standard Materials, Polyimide, SU8, Other Polymers, Photoresist, EBL Resist |
| Sample Size | 6" Wafers, 4" Wafers, Pieces |
| Alternative | ? |
| Keywords | single wafer, manual load, top side of sample, manual operation, alignment |
Description
The Filmetrics-TRL is a thin film measurement system that measures film thickness (mostly on Si substrates). It is capable of measuring transparent film thicknesses and dielectric constants (using spectral reflectance method) without the requirement of creating a step . Recipes for measuring common dielectrics (SiO2, SiNx, Al2O3), semiconductors (amorphous Si) and resists are available in the tool. Recipes have to be made and calibrated for materials that are not in the library. Goodness of fit is shown on the screen to give a sense of the measurement confidence.
| Best for | Measure common dielectrics and resists thickness |
| Limitations | Difficult to measure very thin film thickness (< 15 nm) accurately. |
| Characteristics/FOM | Spectral reflectance method. |
| Caution with | Harder to measure film thickness and dielectric constants simultaneously. |
| Machine Charges | 2/hour |
Documents
Process Matrix Details
PTC Matrix does not apply for EML
Ever been in EMLSamples from EML are never permitted to return to ICL or TRL