Standard organic photoresists, stocked by MTL. Non-stock resists require PTC approval and must be used only with the approved process.

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Process	Lab	Tool	Process Category	Subcategory	Description	Color Code
+	EML	acid-hood-EML	Wet	Solvents	General Purpose Acid Fume-Hood	EML
+	EML	asher-EML	Photo	Clean	Oxygen Plasma	EML
+	EML	coater-EML	Photo	Coat	Photoresist Coater	EML
+	EML	eBeam-AJA	Deposition	Evaporate	Metal and dielectric evaporator	EML
+	EML	filmetrics	Metrology	Thickness	Thin Film Optical Measurement	EML
+	EML	MA-4	Photo	Expose	Contact Lithography Mask Aligner	EML
+	EML	photo-hood-EML	Wet	Solvents	Solvent Fume hood for lithography	EML
+	EML	SolventHood-EML	Wet	Solvents	Solvent Fume hood for lithography	EML
+	ICL	asher-ICL	Photo	Clean	Single wafer oxygen plasma for photoresist removal	Green
+	ICL	pTrack	Photo	Coat	Automated coater and developer track	Green
+	ICL	eBeam-EVO	Deposition	Evaporate	Metal evaporator of CMOS compatible metals	Green
+	ICL	i-stepper	Photo	Expose	i-line stepper	Red &Green
+	ICL	premetal-Piranha	Wet	Acids	Piranha resist removal and cleaning station	Green
+	ICL	UV1280	Metrology	Thickness	Thin film characterization	Green
	MTL	Procedures-Cleaning	Procedures	Clean	Sample Cleaning	Red &Green
	MTL	Procedures-General	Procedures	General	Broader concepts	Red &Green
	MTL	Procedures-Lithography	Procedures	Photo	Lithography	Red &Green
+	TRL	acid-hood	Wet	Acids	Acid processing station	Red &Green
+	TRL	asherMatrix-TRL	Photo	Clean	Single wafer oxygen plasma for photoresist removal	Red
+	TRL	asher-TRL	Photo	Clean	Barrel asher for resist removal	Red &Green
+	TRL	coater	Photo	Coat	Manual spin-coater for photoresists	Red &Green
+	TRL	develop-Brewer	Photo	Coat	Resist develop and postbake	Red &Green
+	TRL	eBeamAu	Deposition	Evaporate	Metal evaporator	Red
+	TRL	eBeamFP	Deposition	Evaporate	Fast pumping metal evaporator	Red
+	TRL	ellipsometer-TRL	Metrology	Thickness	Thin film thickness measurement	Red &Green
+	TRL	EV1	Photo	Expose	Contact mask aligner	Red &Green
+	TRL	EV-LC	Photo	Expose	Contact mask aligner	Red &Green
+	TRL	Filmetrics-TRL	Metrology	Thickness	Thin film thickness measurement	Red &Green
+	TRL	Greenflo	Wet	Acids	Acid processing station	Red &Green
+	TRL	Heidelberg	Photo	Expose	Laser direct-write exposure for wafers and masks	Red &Green
+	TRL	hotplate1	Photo	Bake	Hotplate for lithography	Red &Green
+	TRL	hotplate2	Photo	Bake	Hotplate for lithography	Red &Green
+	TRL	hotplate300	Photo	Bake	Hotplate for lithography	Red &Green
+	TRL	MA-6	Photo	Expose	Contact mask aligner	Red &Green
+	TRL	MLA-150	Photo	Expose	Direct-write lithography for wafers and larger pieces	Red &Green
+	TRL	nanospec	Metrology	Thickness	Thin film thickness measurement	Red &Green
+	TRL	OAI-Flood	Photo	Expose	Flood exposure for image reversal resists	Red &Green
+	TRL	photo-wet-Au	Wet	Solvents	Solvent fume hood with sonicator	Red &Green
+	TRL	photo-wet-l	Wet	Solvents	Wetbench for photoresist development	Red &Green
+	TRL	photo-wet-r	Wet	Solvents	Wetbench for photoresist development	Red &Green
+	TRL	PMMAspinner	Photo	Coat	Manual coater for PMMA and other photoresists	Red &Green
+	TRL	postbake	Photo	Bake	Bake oven 120C	Red &Green
+	TRL	prebakeovn	Photo	Bake	Bake oven 90C	Red &Green
+	TRL	Resonetics	Photo	Expose	Laser ablation system	Red
+	TRL	SolventHood-TRL	Wet	Solvents	Solvent fume hood	Red &Green
+	TRL	varTemp	Photo	Bake	Bake oven for variable temperature	Red