Equipment
| Lab and Coral Name | EML / coater-EML |
| Model | Solitec |
| Specialist | Kurt Broderick (Timothy Turner, Gary Riggott) |
| Physical Location | 5F 1-South Photo |
Classification
| Process Category | Photo |
| Subcategory | Coat |
| Material Keywords | Polyimide, SU8, Other Polymers, Photoresist, EBL Resist |
| Sample Size | 6" Wafers, 4" Wafers, Pieces |
| Alternative | ? |
| Keywords | single wafer, manual load, top side of sample, manual operation, spinning substrate |
Description
This is a manual dispense spinner that can coat photoresists and other spinnable (spreadable) polymers (such as PMMA, BCB, SU8, SOG, etc)
| Best for | Experimental materials, coating wafer/pieces for EML processing |
| Limitations | Samples with backside topology (e.g. deep trenches) may not pull sufficient vaccum. Small pieces can be difficult to coat due to edge beads. |
| Characteristics/FOM | |
| Caution with | |
| Machine Charges | 2/wafer |
Documents
SOP
| Resist Recipes | Baseline resist recipes for TRL |
Documents
| SPR700 | Datasheet for SPR700 standard resist |
| Photoresist | Application Note describing photoresist chemistry |
| Liftoff Resist | Application Note describing liftoff resists |
| Coating | Application Note describing spincoating |
| Developing Resist | Application Note describing resist development |
External Links
| Guide | MicroChem Application Notes |
Process Matrix Details
PTC Matrix does not apply for EML
Ever been in EMLSamples from EML are never permitted to return to ICL or TRL