Equipment
Lab and Coral Name | EML / coater-EML |
Model | Solitec |
Specialist | Kurt Broderick (Timothy Turner, Gary Riggott) |
Physical Location | 5F 1-South Photo |
Classification
Process Category | Photo |
Subcategory | Coat |
Material Keywords | Polyimide, SU8, Other Polymers, Photoresist, EBL Resist |
Sample Size | 6" Wafers, 4" Wafers, Pieces |
Alternative | ? |
Keywords | single wafer, manual load, top side of sample, manual operation, spinning substrate |
Description
This is a manual dispense spinner that can coat photoresists and other spinnable (spreadable) polymers (such as PMMA, BCB, SU8, SOG, etc)
Best for | Experimental materials, coating wafer/pieces for EML processing |
Limitations | Samples with backside topology (e.g. deep trenches) may not pull sufficient vaccum. Small pieces can be difficult to coat due to edge beads. |
Characteristics/FOM | |
Caution with | |
Machine Charges | 2/wafer |
Documents
SOP
Resist Recipes | Baseline resist recipes for TRL |
Documents
SPR700 | Datasheet for SPR700 standard resist |
Photoresist | Application Note describing photoresist chemistry |
Liftoff Resist | Application Note describing liftoff resists |
Coating | Application Note describing spincoating |
Developing Resist | Application Note describing resist development |
External Links
Guide | MicroChem Application Notes |
Process Matrix Details
PTC Matrix does not apply for EML
Ever been in EMLSamples from EML are never permitted to return to ICL or TRL