The standard 150mm (or 6") wafers sizes used at MTL. Note that most wafers are actually 150mm, and not true 6". Wafer flats are required for some tools. Almost all tools can accommodate these wafers.

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Process	Lab	Tool	Keywords	0	Description	Color Code
+	EBL	Elionix	ERRORERROR	Electron beam lithography system	Red &Green
+	EML	acid-hood-EML	ERRORERROR	General Purpose Acid Fume-Hood	EML
+	EML	ALD-EML	ERRORERROR	Atomic Layer Deposition	EML
+	EML	Box-Furnace	ERRORERROR	Anneal Furnace	EML
+	EML	coater-EML	ERRORERROR	Photoresist Coater	EML
+	EML	dektak-EML	ERRORERROR	Surface Profilerometer	EML
+	EML	eBeam-AJA	ERRORERROR	Metal and dielectric evaporator	EML
+	EML	filmetrics	ERRORERROR	Thin Film Optical Measurement	EML
+	EML	parametric-tester	ERRORERROR	Probe station for electrical measurements	EML
+	EML	photo-hood-EML	ERRORERROR	Solvent Fume hood for lithography	EML
+	EML	plasmatherm	ERRORERROR	Plasma Etch and Deposition	EML
+	EML	SolventHood-EML	ERRORERROR	Solvent Fume hood for lithography	EML
+	EML	SputtererAJA	ERRORERROR	Sputter deposition tool	EML
+	EML	vac-oven	ERRORERROR	Temperature controlled vacuum oven	EML
+	TRL	2Dtransfer-platingHood	ERRORERROR	Electroplating wet bench and fume hood	Red
+	ICL	4-pt-probe	ERRORERROR	Sheet resistance measurement of semiconductors	Red
+	ICL	5A-GateOx	ERRORERROR	Diffusion tube for gate oxide growth	Green
+	ICL	5B-Anneal	ERRORERROR	Annealing tube	Green
+	ICL	5C-FieldOx	ERRORERROR	Diffusion tube for wet oxide growth of thicker films	Green
+	ICL	5D-ThickOx	ERRORERROR	Diffusion tube for wet oxide growth of thicker films	Green
+	ICL	6A-nPoly	ERRORERROR	Polysilicon deposition tube for n-type poly Si	Green
+	ICL	6B-Poly	ERRORERROR	Polysilicon deposition tube for p-type poly Si	Green
+	ICL	6C-LTO	ERRORERROR	Low temperature CVD oxide deposition	Green
+	ICL	6D-Nitride	ERRORERROR	Deposition of stoichiometric silicon nitride	Green
+	ICL	AFM	ERRORERROR	Atomic Force Microscope for Surface Analysis	Red &Green
+	ICL	ALD	ERRORERROR	Atomic Layer Deposition	Red
+	ICL	ALD-Oxford	ERRORERROR	Atomic Layer Deposition	Green
+	ICL	AME5000	ERRORERROR	RIE etcher for frontend silicon processes	Green
+	ICL	asher-ICL	ERRORERROR	Single wafer oxygen plasma for photoresist removal	Green
+	ICL	pTrack	ERRORERROR	Automated coater and developer track	Green
+	ICL	concept1	ERRORERROR	PECVD deposition of oxides, nitrides, and TEOS	Green
+	ICL	cv	ERRORERROR	Electrical characterization of dielectrics	Green
+	ICL	DCVD	ERRORERROR	PECVD deposition of oxides, nitrides, and a-Si	Green
+	ICL	diesaw	ERRORERROR	Wafer dicing saw	Red
+	ICL	diesaw-3240	ERRORERROR	Wafer dicing saw	Red
+	ICL	eBeam-EVO	ERRORERROR	Metal evaporator of CMOS compatible metals	Green
+	ICL	endura	ERRORERROR	Metal sputter deposition	Green
+	ICL	epi-Centura	ERRORERROR	Not open to public	Green
+	ICL	GnP	ERRORERROR	Chemical Mechanical Polishing to planarize surfaces	Red &Green
+	ICL	goldwire	ERRORERROR	Gold ball bonder for device packaging	Red
+	ICL	i-stepper	ERRORERROR	i-line stepper	Red &Green
+	ICL	LAM490B	ERRORERROR	Chlorine based plasma etching of silicon	Green
+	ICL	LAM590-ICL	ERRORERROR	Fluorine based plasma etching of silicon oxide and nitrides	Green
+	ICL	nitrEtch-HotPhos	ERRORERROR	Hot phosphoric nitride etch bath	Green
+	ICL	oxEtch-BOE	ERRORERROR	Silicon dioxide etch bath	Green
+	ICL	Oxford-100_PECVD	ERRORERROR	Dual chamber PECVD and plasma etch tool	Red
+	ICL	Oxford-100_Etch	ERRORERROR	Dual chamber PECVD and plasma etch tool	Red
+	ICL	P10	ERRORERROR	Stylus profilerometer	Green
+	ICL	premetal-Piranha	ERRORERROR	Piranha resist removal and cleaning station	Green
+	ICL	rainbow	ERRORERROR	Chlorine based plasma etcher for metals	Green
+	ICL	rca-ICL	ERRORERROR	Wafer cleaning before diffusion tubes	Green
+	ICL	RTA2	ERRORERROR	Rapid Thermal Annealing	Green
+	ICL	RTA-pieces	ERRORERROR	Rapid Thermal Annealing	Red
+	ICL	RTP	ERRORERROR	Rapid Thermal Annealing	Green
+	ICL	RTP-Si	ERRORERROR	Rapid Thermal Annealing	Green
+	ICL	semZeiss	ERRORERROR	Scanning Electron Microscope	Red &Green
+	ICL	SM-300	ERRORERROR	Thickness measurement for CMP processing	Red &Green
+	ICL	TMAH-KOHhood	ERRORERROR	Silicon bulk wet etching	Red &Green
+	ICL	UV1280	ERRORERROR	Thin film characterization	Green
+	ICL	VTR	ERRORERROR	Low stress silicon nitride deposition	Green
+	ICL	wykoICL	ERRORERROR	Optical profiling system	Green
+	TRL	A1-GateOx	ERRORERROR	Thermal Oxidation for Green Silicon Wafers	Green
+	TRL	A2-WetOxBond	ERRORERROR	Thermal Oxidation and other thermal process for GREEN Si wafers	Green
+	TRL	A3-Sinter	ERRORERROR	Sintering for GREEN Si wafers	Green
+	TRL	A4-III-Vanneal	ERRORERROR	Annealing for GREEN III-V samples	Red
+	TRL	acid-hood	ERRORERROR	Acid processing station	Red &Green
+	TRL	AJA-TRL	ERRORERROR	Sputter deposition tool	Red
+	TRL	asherMatrix-TRL	ERRORERROR	Single wafer oxygen plasma for photoresist removal	Red
+	TRL	asher-TRL	ERRORERROR	Barrel asher for resist removal	Red &Green
+	TRL	B1-Au	ERRORERROR	Gold compatible anneal tube	Red
+	TRL	B2-Ox-alloy-Poly	ERRORERROR	Thermal Oxidation and LPCVD Polysilicon for RED wafers	Green
+	TRL	B3-DryOx	ERRORERROR	Thermal Oxidation	Green
+	TRL	B4-Poly	ERRORERROR	LPCVD polysilicon for Green wafers	Green
+	TRL	CCNT	ERRORERROR	Carbon nanotube growth	Red
+	TRL	coater	ERRORERROR	Manual spin-coater for photoresists	Red &Green
+	TRL	dek-NoAu	ERRORERROR	Stylus Profilerometer	Green
+	TRL	dektak-XT	ERRORERROR	Stylus Profilerometer	Red
+	TRL	develop-Brewer	ERRORERROR	Resist develop and postbake	Red &Green
+	TRL	eBeamAu	ERRORERROR	Metal evaporator	Red
+	TRL	eBeamFP	ERRORERROR	Fast pumping metal evaporator	Red
+	TRL	ellipsometer-TRL	ERRORERROR	Thin film thickness measurement	Red &Green
+	TRL	EV1	ERRORERROR	Contact mask aligner	Red &Green
+	TRL	EV501	ERRORERROR	Bonder system to apply heat, vacuum and pressure	Red &Green
+	TRL	EV620	ERRORERROR	Aligner for bonding	Red &Green
+	TRL	EV-LC	ERRORERROR	Contact mask aligner	Red &Green
+	TRL	Filmetrics-TRL	ERRORERROR	Thin film thickness measurement	Red &Green
+	TRL	FLX	ERRORERROR	Thin film stress measurement	Red &Green
+	TRL	Greenflo	ERRORERROR	Acid processing station	Red &Green
+	TRL	Hall-probe	ERRORERROR	Carrier measurement	Red
+	TRL	Heidelberg	ERRORERROR	Laser direct-write exposure for wafers and masks	Red &Green
+	TRL	HMDS-TRL	ERRORERROR	HMDS oven	Red &Green
+	TRL	hotplate1	ERRORERROR	Hotplate for lithography	Red &Green
+	TRL	hotplate2	ERRORERROR	Hotplate for lithography	Red &Green
+	TRL	hotplate300	ERRORERROR	Hotplate for lithography	Red &Green
+	TRL	IV-probe	ERRORERROR	Probe station with curve tracer for IV measurement	Red
+	TRL	LAM590-TRL	ERRORERROR	Fluorine based plasma etching of oxide and nitrides	Red
+	TRL	MA-6	ERRORERROR	Contact mask aligner	Red &Green
+	TRL	MLA-150	ERRORERROR	Direct-write lithography for wafers and larger pieces	Red &Green
+	TRL	nanospec	ERRORERROR	Thin film thickness measurement	Red &Green
+	TRL	OAI-Flood	ERRORERROR	Flood exposure for image reversal resists	Red &Green
+	TRL	parylene	ERRORERROR	Parylene depopsition	Red
+	TRL	photo-wet-Au	ERRORERROR	Solvent fume hood with sonicator	Red &Green
+	TRL	photo-wet-l	ERRORERROR	Wetbench for photoresist development	Red &Green
+	TRL	photo-wet-r	ERRORERROR	Wetbench for photoresist development	Red &Green
+	TRL	PMMAspinner	ERRORERROR	Manual coater for PMMA and other photoresists	Red &Green
+	TRL	postbake	ERRORERROR	Bake oven 120C	Red &Green
+	TRL	prebakeovn	ERRORERROR	Bake oven 90C	Red &Green
+	TRL	PZTcoater	ERRORERROR	Coater to apply PZT films	Red
+	TRL	PZTfurnace	ERRORERROR	Bake oven for PZT coated wafers	Red
+	TRL	rca-TRL	ERRORERROR	Wafer cleaning before diffusion tubes	Green
+	TRL	Resonetics	ERRORERROR	Laser ablation system	Red
+	TRL	RTA-HiT	ERRORERROR	Rapid Thermal Annealing	Red
+	TRL	SAMCO	ERRORERROR	Chlorine based plasma etcher for III-V materials	Red
+	TRL	SolventHood-TRL	ERRORERROR	Solvent fume hood	Red &Green
+	TRL	sts1	ERRORERROR	Deep reactive ion etcher for silicon	Red
+	TRL	sts2	ERRORERROR	Deep reactive ion etcher for silicon	Green
+	TRL	sts-CVD	ERRORERROR	PECVD deposition of oxides, nitrides, a-Si, SiC, and P-doped a-Si	Red
+	TRL	sts-Pegasus	ERRORERROR	Deep reactive ion etcher for silicon	Red
+	TRL	SU8spinner	ERRORERROR	Manual spin-coater for SU8 resists	Purple
+	TRL	TBM-8	ERRORERROR	Front-to-back alignement measurement	Red &Green
+	TRL	UVozone-Au	ERRORERROR	Cleans residual organics	Red
+	TRL	varTemp	ERRORERROR	Bake oven for variable temperature	Red
+	TRL	WYKO	ERRORERROR	Optical profiling system	Red &Green
+	TRL	XeF2	ERRORERROR	XeF2 isotropic etching of silicon	Red
+	LEAP	X-rayInspection	ERRORERROR	X-Ray imaging	Red
+	LEAP	PlasmaCleaner	ERRORERROR	Plasma parts cleaning	Red
+	LEAP	ReflowOven	ERRORERROR	Reflow oven	Red
+	LEAP	QuickVisionMicroscope	ERRORERROR	Automated imaging microscope	Red