Equipment
Lab and Coral NameTRL / develop-Brewer
ModelBrewer CES
SpecialistDennis Ward     (Kristofor Payer)
Physical Location4F Photo-North
Classification
Process CategoryPhoto
SubcategoryCoat
Material KeywordsSilicon, III-V, GaN, Quartz, Pyrex, Photoresist, Developer
Sample Size6" Wafers, 4" Wafers, 7" Photo Plates, 5" Photo Plates
AlternativeTRL / photo-wet-l
Keywordssingle wafer, manual load, top side of sample, spinning substrate
Description
The develop-Brewer is a single wafer spin-develop system for puddle and spray developing of wafers. Both CD26 and AZ422 are available as developers. The system also has a built-in hotplate for postbaking [RED] wafers. The hotplate can also be used to cure polyimide under N2.

Best forStandard resist develop in TRL
LimitationsDeveloper tanks are small, and can be used up relatively fast. Check tank status on the scale in advance, and contact staff if refill is needed. Developing pieces is not permitted, and is best done in beakers. Hotplate for [RED] wafers only, and limited for postbakes only (no prebake).
Characteristics/FOMCD26, AZ422MIF
Caution withDon't open developer tanks unless trained, as tanks are pressurized. Brewer software often crashes when not in use.
Machine Charges2/wafer
Documents

SOP
DeveloperSOP for the Brewer developer and hotplate
Resist RecipesBaseline resist recipes for TRL

Documents
SPR700Datasheet for SPR700 standard resist
PhotoresistApplication Note describing photoresist chemistry
Liftoff ResistApplication Note describing liftoff resists
CoatingApplication Note describing spincoating
Developing ResistApplication Note describing resist development

External Links
GuideMicroChem Application Notes
Process Matrix Details

Permitted


Not Allowed
Ever been in EMLSamples from EML are never permitted to return to ICL or TRL


For more details or help, please consult PTC matrix, email ptc@mtl.mit.edu, or ask the research specialist (Dennis Ward )