Dennis Ward
Research Specialist
39-561 - (617)452-4905 - ward@mtl.mit.edu

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Process	Lab	Tool	Process Category	Subcategory	Description	Color Code
+	TRL	Balzer-Elionix	Deposition	Sputter	SEM or EBL sample preparation	Red
+	TRL	develop-Brewer	Photo	Coat	Resist develop and postbake	Red &Green
+	TRL	EV501	Photo	Bond	Bonder system to apply heat, vacuum and pressure	Red &Green
+	TRL	EV620	Photo	Bond	Aligner for bonding	Red &Green
+	TRL	FLX	Metrology	Profile	Thin film stress measurement	Red &Green
+	TRL	Heidelberg	Photo	Expose	Laser direct-write exposure for wafers and masks	Red &Green
+	TRL	MLA-150	Photo	Expose	Direct-write lithography for wafers and larger pieces	Red &Green
+	TRL	parylene	Deposition	CVD	Parylene depopsition	Red
+	TRL	PMMAspinner	Photo	Coat	Manual coater for PMMA and other photoresists	Red &Green
+	TRL	PZTcoater	Deposition	Spin-Coat	Coater to apply PZT films	Red
+	TRL	PZTfurnace	Deposition	Bake	Bake oven for PZT coated wafers	Red
+	TRL	Resonetics	Photo	Expose	Laser ablation system	Red
+	TRL	SU8oven	Photo	Bake	Oven to dry foil from SU8 coater	Purple
+	TRL	SU8spinner	Photo	Coat	Manual spin-coater for SU8 resists	Purple
+	TRL	TBM-8	Photo	Bond	Front-to-back alignement measurement	Red &Green