The 7" plates are used for contact lithography masks to expose 6" wafers.

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Process	Lab	Tool	Keywords	0	Description	Color Code
+	EBL	Elionix	ERRORERROR	Electron beam lithography system	Red &Green
+	EML	acid-hood-EML	ERRORERROR	General Purpose Acid Fume-Hood	EML
+	EML	photo-hood-EML	ERRORERROR	Solvent Fume hood for lithography	EML
+	EML	SolventHood-EML	ERRORERROR	Solvent Fume hood for lithography	EML
+	ICL	wykoICL	ERRORERROR	Optical profiling system	Green
+	TRL	acid-hood	ERRORERROR	Acid processing station	Red &Green
+	TRL	dek-NoAu	ERRORERROR	Stylus Profilerometer	Green
+	TRL	dektak-XT	ERRORERROR	Stylus Profilerometer	Red
+	TRL	develop-Brewer	ERRORERROR	Resist develop and postbake	Red &Green
+	TRL	ellipsometer-TRL	ERRORERROR	Thin film thickness measurement	Red &Green
+	TRL	Filmetrics-TRL	ERRORERROR	Thin film thickness measurement	Red &Green
+	TRL	Greenflo	ERRORERROR	Acid processing station	Red &Green
+	TRL	Heidelberg	ERRORERROR	Laser direct-write exposure for wafers and masks	Red &Green
+	TRL	IV-probe	ERRORERROR	Probe station with curve tracer for IV measurement	Red
+	TRL	MLA-150	ERRORERROR	Direct-write lithography for wafers and larger pieces	Red &Green
+	TRL	nanospec	ERRORERROR	Thin film thickness measurement	Red &Green
+	TRL	photo-wet-Au	ERRORERROR	Solvent fume hood with sonicator	Red &Green
+	TRL	photo-wet-l	ERRORERROR	Wetbench for photoresist development	Red &Green
+	TRL	photo-wet-r	ERRORERROR	Wetbench for photoresist development	Red &Green
+	TRL	SolventHood-TRL	ERRORERROR	Solvent fume hood	Red &Green
+	TRL	TBM-8	ERRORERROR	Front-to-back alignement measurement	Red &Green
+	TRL	varTemp	ERRORERROR	Bake oven for variable temperature	Red
+	TRL	WYKO	ERRORERROR	Optical profiling system	Red &Green
+	LEAP	X-rayInspection	ERRORERROR	X-Ray imaging	Red
+	LEAP	QuickVisionMicroscope	ERRORERROR	Automated imaging microscope	Red