My Process:

View by Attribute: Permitted Sample Size

The standard wafer size at MTL is 6" wafers (150mm). However, many users process smaller samples, and this is indicated by the sample size attribute. But, especially when processing pieces, be aware of special requirements for the tool you're using. For example, placing a piece on a handle wafer may be acceptable for some tools (e.g. STS-CVD), while it can cause problems for your sample in other tools (e.g. LAM-590-TRL). Thus, check with the staff about the best practices for each tool.


AttributeDescriptionTool List
4" Wafers 100 mm (4") wafers Elionix,acid-hood-EML,ALD-EML,anneal-furnace,asher-EML,Box-Furnace,coater-EML,dektak-EML,eBeam-AJA,filmetrics,MA-4,OxidationTube,parametric-tester,photo-hood-EML,plasmatherm,RTA-EML,SolventHood-EML,SputtererAJA,vac-oven,2Dtransfer-platingHood,5A-GateOx,5B-Anneal,5C-FieldOx,5D-ThickOx,6A-nPoly,6B-Poly,6C-LTO,6D-Nitride,AFM,ALD,ALD-Oxford,asher-ICL,diesaw,diesaw-3240,eBeam-EVO,GnP,goldwire,i-stepper,nitrEtch-HotPhos,oxEtch-BOE,Oxford-100_PECVD,Oxford-100_Etch,premetal-Piranha,rca-ICL,RTA2,RTA-pieces,RTP,RTP-Si,semZeiss,TMAH-KOHhood,UV1280,VTR,wykoICL,A1-GateOx,A2-WetOxBond,A3-Sinter,A4-III-Vanneal,acid-hood,AJA-TRL,asher-TRL,B1-Au,B2-Ox-alloy-Poly,B3-DryOx,B4-Poly,CCNT,coater,dek-NoAu,dektak-XT,develop-Brewer,eBeamAu,eBeamFP,ellipsometer-TRL,EV1,EV501,EV620,EV-LC,Filmetrics-TRL,FLX,Greenflo,Hall-probe,Heidelberg,HMDS-TRL,hotplate1,hotplate2,hotplate300,IV-probe,MA-6,MLA-150,nanospec,OAI-Flood,parylene,photo-wet-Au,photo-wet-l,photo-wet-r,plasmaquest,PMMAspinner,postbake,prebakeovn,PZTcoater,PZTfurnace,rca-TRL,Resonetics,RTA-HiT,SAMCO,SolventHood-TRL,sts-CVD,SU8spinner,TBM-8,UVozone-Au,varTemp,WYKO,XeF2,X-rayInspection,PlasmaCleaner,ReflowOven,QuickVisionMicroscope,
5" Photo Plates 5" square glass plates (4" wafer photomask) Elionix,acid-hood-EML,photo-hood-EML,SolventHood-EML,wykoICL,acid-hood,dek-NoAu,dektak-XT,develop-Brewer,ellipsometer-TRL,Filmetrics-TRL,Greenflo,Heidelberg,IV-probe,MLA-150,nanospec,photo-wet-Au,photo-wet-l,photo-wet-r,SolventHood-TRL,TBM-8,varTemp,WYKO,X-rayInspection,PlasmaCleaner,ReflowOven,QuickVisionMicroscope,
6" Wafers 150 mm (6") wafers (the standard size in MTL) Elionix,acid-hood-EML,ALD-EML,Box-Furnace,coater-EML,dektak-EML,eBeam-AJA,filmetrics,parametric-tester,photo-hood-EML,plasmatherm,SolventHood-EML,SputtererAJA,vac-oven,2Dtransfer-platingHood,4-pt-probe,5A-GateOx,5B-Anneal,5C-FieldOx,5D-ThickOx,6A-nPoly,6B-Poly,6C-LTO,6D-Nitride,AFM,ALD,ALD-Oxford,AME5000,asher-ICL,pTrack,concept1,cv,DCVD,diesaw,diesaw-3240,eBeam-EVO,endura,epi-Centura,GnP,goldwire,i-stepper,LAM490B,LAM590-ICL,nitrEtch-HotPhos,oxEtch-BOE,Oxford-100_PECVD,Oxford-100_Etch,P10,premetal-Piranha,rainbow,rca-ICL,RTA2,RTA-pieces,RTP,RTP-Si,semZeiss,SM-300,TMAH-KOHhood,UV1280,VTR,wykoICL,A1-GateOx,A2-WetOxBond,A3-Sinter,A4-III-Vanneal,acid-hood,AJA-TRL,asherMatrix-TRL,asher-TRL,B1-Au,B2-Ox-alloy-Poly,B3-DryOx,B4-Poly,CCNT,coater,dek-NoAu,dektak-XT,develop-Brewer,eBeamAu,eBeamFP,ellipsometer-TRL,EV1,EV501,EV620,EV-LC,Filmetrics-TRL,FLX,Greenflo,Hall-probe,Heidelberg,HMDS-TRL,hotplate1,hotplate2,hotplate300,IV-probe,LAM590-TRL,MA-6,MLA-150,nanospec,OAI-Flood,parylene,photo-wet-Au,photo-wet-l,photo-wet-r,PMMAspinner,postbake,prebakeovn,PZTcoater,PZTfurnace,rca-TRL,Resonetics,RTA-HiT,SAMCO,SolventHood-TRL,sts1,sts2,sts-CVD,sts-Pegasus,SU8spinner,TBM-8,UVozone-Au,varTemp,WYKO,XeF2,X-rayInspection,PlasmaCleaner,ReflowOven,QuickVisionMicroscope,
7" Photo Plates 7" square glass plates (6" wafer photomask) Elionix,acid-hood-EML,photo-hood-EML,SolventHood-EML,wykoICL,acid-hood,dek-NoAu,dektak-XT,develop-Brewer,ellipsometer-TRL,Filmetrics-TRL,Greenflo,Heidelberg,IV-probe,MLA-150,nanospec,photo-wet-Au,photo-wet-l,photo-wet-r,SolventHood-TRL,TBM-8,varTemp,WYKO,X-rayInspection,QuickVisionMicroscope,
8" Wafers 200 mm (8") wafers Elionix,wykoICL,Filmetrics-TRL,Heidelberg,IV-probe,MLA-150,photo-wet-Au,photo-wet-l,photo-wet-r,SolventHood-TRL,varTemp,WYKO,X-rayInspection,QuickVisionMicroscope,
None No sample size Procedures-Cleaning,Procedures-Deposition,Procedures-Etching,Procedures-General,Procedures-Lithography,Procedures-Metrology,SU8oven,OutsideLab,CNS,NSL,SNL,
Pieces Pieces of various sizes and shapes Elionix,acid-hood-EML,ALD-EML,anneal-furnace,asher-EML,BalzerSputterer,Box-Furnace,coater-EML,dektak-EML,eBeam-AJA,filmetrics,hotpress,MA-4,OxidationTube,parametric-tester,photo-hood-EML,plasmatherm,RTA-EML,semNeo,SolventHood-EML,SputtererAJA,vac-oven,2Dtransfer-platingHood,AFM,ALD,ALD-Oxford,diesaw,diesaw-3240,eBeam-EVO,goldwire,Oxford-100_PECVD,Oxford-100_Etch,semZeiss,TMAH-KOHhood,wykoICL,acid-hood,AJA-TRL,asher-TRL,Balzer-Elionix,CCNT,coater,dek-NoAu,dektak-XT,eBeamAu,eBeamFP,ellipsometer-TRL,EV1,EV501,EV620,EV-LC,Filmetrics-TRL,Greenflo,Hall-probe,Heidelberg,HMDS-TRL,hotplate1,hotplate2,hotplate300,IV-probe,MA-6,MLA-150,nanospec,OAI-Flood,parylene,photo-wet-Au,photo-wet-l,photo-wet-r,plasmaquest,PMMAspinner,postbake,prebakeovn,PZTcoater,PZTfurnace,Resonetics,RTA-HiT,SAMCO,SolventHood-TRL,sts-CVD,SU8spinner,TBM-8,UVozone-Au,varTemp,WYKO,XeF2,AutoBonder,BallBonder,WedgeBonder,X-rayInspection,DieBonder,PlasmaCleaner,ReflowOven,QuickVisionMicroscope,
Pieces Require Puck Pieces with special puck for a tool concept1,endura,GnP,i-stepper,LAM490B,LAM590-ICL,rainbow,RTA2,RTA-pieces,RTP,RTP-Si,UV1280,VTR,asherMatrix-TRL,LAM590-TRL,sts1,sts2,sts-Pegasus,