Equipment
| Lab and Coral Name | MTL / Procedures-Lithography |
| Model | n/a |
| Specialist | Kristofor Payer (Paul Tierney) |
| Physical Location | Web |
Classification
| Process Category | Procedures |
| Subcategory | Photo |
| Material Keywords | Polyimide, SU8, Other Polymers, Photoresist, EBL Resist, Developer |
| Sample Size | None |
| Alternative | ? |
| Keywords | None |
Description
This page captures a broader set of procedures that relate to lithography.
| Best for | |
| Limitations | |
| Characteristics/FOM | |
| Caution with | |
| Machine Charges | no charge |
Documents
Documents
| HMDS Oven | Application Note describing HMDS procedures |
| AZ5214E | Datasheet for AZ5214E image reversal resist |
| AZ4620 | Datasheet for AZ4620 thick resist |
| Photoresist | Application Note describing photoresist chemistry |
| Liftoff Resist | Application Note describing liftoff resists |
| Image reversal | Application Note describing image reversal |
| Coating | Application Note describing spincoating |
| Developing Resist | Application Note describing resist development |
| HD4100 | Datasheet for HD4100 polyimide |
| maN2400 | Datasheet for maN2400 e-beam resist |
External Links
| Guide | MicroChem Application Notes |
Process Matrix Details
Permitted
Not Allowed
Ever been in EMLSamples from EML are never permitted to return to ICL or TRL
For more details or help, please consult PTC matrix, email ptc@mtl.mit.edu, or ask the research specialist (Kristofor Payer)