Paul Tierney
Research Specialist, Photolithography
39-229 - (617)253-5245 - tierney@mtl.mit.edu

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Process	Lab	Tool	Process Category	Subcategory	Description	Color Code
+	ICL	asher-ICL	Photo	Clean	Single wafer oxygen plasma for photoresist removal	Green
+	ICL	pTrack	Photo	Coat	Automated coater and developer track	Green
+	ICL	i-stepper	Photo	Expose	i-line stepper	Red &Green
+	ICL	nitrEtch-HotPhos	Wet	Acids	Hot phosphoric nitride etch bath	Green
+	ICL	oxEtch-BOE	Wet	Acids	Silicon dioxide etch bath	Green
+	ICL	premetal-Piranha	Wet	Acids	Piranha resist removal and cleaning station	Green
+	ICL	semZeiss	Metrology	SEM	Scanning Electron Microscope	Red &Green