Machines by Material Keyword: Developer
| Process | Lab | Tool | Process Category | Subcategory | Description | |
|---|---|---|---|---|---|---|
| EML | photo-hood-EML | Wet | Solvents | Solvent Fume hood for lithography | ||
| ICL | pTrack | Photo | Coat | Automated coater and developer track | ||
| MTL | Procedures-Lithography | Procedures | Photo | Lithography | ||
| TRL | develop-Brewer | Photo | Coat | Resist develop and postbake | ||
| TRL | photo-wet-Au | Wet | Solvents | Solvent fume hood with sonicator | ||
| TRL | photo-wet-l | Wet | Solvents | Wetbench for photoresist development | ||
| TRL | photo-wet-r | Wet | Solvents | Wetbench for photoresist development | ||
| TRL | SolventHood-TRL | Wet | Solvents | Solvent fume hood |