Machines by Material Keyword: Other Polymers
| Process | Lab | Tool | Process Category | Subcategory | Description | |
|---|---|---|---|---|---|---|
| EML | acid-hood-EML | Wet | Solvents | General Purpose Acid Fume-Hood | ||
| EML | asher-EML | Photo | Clean | Oxygen Plasma | ||
| EML | coater-EML | Photo | Coat | Photoresist Coater | ||
| EML | filmetrics | Metrology | Thickness | Thin Film Optical Measurement | ||
| EML | hotpress | Photo | Bond | Pressing for thermoplastic films | ||
| EML | MA-4 | Photo | Expose | Contact Lithography Mask Aligner | ||
| EML | photo-hood-EML | Wet | Solvents | Solvent Fume hood for lithography | ||
| EML | SolventHood-EML | Wet | Solvents | Solvent Fume hood for lithography | ||
| ICL | i-stepper | Photo | Expose | i-line stepper | ||
| ICL | Oxford-100_PECVD | Deposition, Etch | PECVD | Dual chamber PECVD and plasma etch tool | ||
| ICL | Oxford-100_Etch | Deposition, Etch | RIE | Dual chamber PECVD and plasma etch tool | ||
| MTL | Procedures-Cleaning | Procedures | Clean | Sample Cleaning | ||
| MTL | Procedures-Lithography | Procedures | Photo | Lithography | ||
| TRL | coater | Photo | Coat | Manual spin-coater for photoresists | ||
| TRL | ellipsometer-TRL | Metrology | Thickness | Thin film thickness measurement | ||
| TRL | Filmetrics-TRL | Metrology | Thickness | Thin film thickness measurement | ||
| TRL | hotplate1 | Photo | Bake | Hotplate for lithography | ||
| TRL | hotplate2 | Photo | Bake | Hotplate for lithography | ||
| TRL | hotplate300 | Photo | Bake | Hotplate for lithography | ||
| TRL | nanospec | Metrology | Thickness | Thin film thickness measurement | ||
| TRL | OAI-Flood | Photo | Expose | Flood exposure for image reversal resists | ||
| TRL | parylene | Deposition | CVD | Parylene depopsition | ||
| TRL | photo-wet-Au | Wet | Solvents | Solvent fume hood with sonicator | ||
| TRL | photo-wet-l | Wet | Solvents | Wetbench for photoresist development | ||
| TRL | photo-wet-r | Wet | Solvents | Wetbench for photoresist development | ||
| TRL | plasmaquest | Etch | RIE | Fluorine and Chlorine general purpose plasma deposition and etch tool | ||
| TRL | PMMAspinner | Photo | Coat | Manual coater for PMMA and other photoresists | ||
| TRL | postbake | Photo | Bake | Bake oven 120C | ||
| TRL | prebakeovn | Photo | Bake | Bake oven 90C | ||
| TRL | Resonetics | Photo | Expose | Laser ablation system | ||
| TRL | SolventHood-TRL | Wet | Solvents | Solvent fume hood | ||
| TRL | UVozone-Au | Etch | Clean | Cleans residual organics | ||
| TRL | varTemp | Photo | Bake | Bake oven for variable temperature |