Plasma based (dry) etching of materials, typically less than 1 um

---

Process	Lab	Tool	Process Category	Subcategory	Description	Color Code
+	EML	plasmatherm	Deposition, Etch	PECVD, RIE	Plasma Etch and Deposition	EML
+	ICL	AME5000	Etch	RIE	RIE etcher for frontend silicon processes	Green
+	ICL	LAM490B	Etch	RIE	Chlorine based plasma etching of silicon	Green
+	ICL	LAM590-ICL	Etch	RIE	Fluorine based plasma etching of silicon oxide and nitrides	Green
+	ICL	Oxford-100_Etch	Deposition, Etch	RIE	Dual chamber PECVD and plasma etch tool	Red
+	ICL	rainbow	Etch	RIE	Chlorine based plasma etcher for metals	Green
+	TRL	LAM590-TRL	Etch	RIE	Fluorine based plasma etching of oxide and nitrides	Red
+	TRL	plasmaquest	Etch	RIE	Fluorine and Chlorine general purpose plasma deposition and etch tool	Red
+	TRL	SAMCO	Etch	RIE	Chlorine based plasma etcher for III-V materials	Red
+	TRL	XeF2	Etch	RIE	XeF2 isotropic etching of silicon	Red