Machines by Material Keyword: SU8
| Process | Lab | Tool | Process Category | Subcategory | Description | |
|---|---|---|---|---|---|---|
| EML | acid-hood-EML | Wet | Solvents | General Purpose Acid Fume-Hood | ||
| EML | coater-EML | Photo | Coat | Photoresist Coater | ||
| EML | filmetrics | Metrology | Thickness | Thin Film Optical Measurement | ||
| EML | MA-4 | Photo | Expose | Contact Lithography Mask Aligner | ||
| EML | photo-hood-EML | Wet | Solvents | Solvent Fume hood for lithography | ||
| MTL | Procedures-Cleaning | Procedures | Clean | Sample Cleaning | ||
| MTL | Procedures-Lithography | Procedures | Photo | Lithography | ||
| TRL | ellipsometer-TRL | Metrology | Thickness | Thin film thickness measurement | ||
| TRL | EV1 | Photo | Expose | Contact mask aligner | ||
| TRL | Filmetrics-TRL | Metrology | Thickness | Thin film thickness measurement | ||
| TRL | hotplate1 | Photo | Bake | Hotplate for lithography | ||
| TRL | hotplate2 | Photo | Bake | Hotplate for lithography | ||
| TRL | hotplate300 | Photo | Bake | Hotplate for lithography | ||
| TRL | nanospec | Metrology | Thickness | Thin film thickness measurement | ||
| TRL | OAI-Flood | Photo | Expose | Flood exposure for image reversal resists | ||
| TRL | Resonetics | Photo | Expose | Laser ablation system | ||
| TRL | SU8spinner | Photo | Coat | Manual spin-coater for SU8 resists |