EML / eBeam-AJA: Metal and dielectric evaporator    Add eBeam-AJA

The eBeam-AJA is a metal evaporator that uses an electron beam to heat a target under ultra-high vacuum. The electron beam that heats the target material sweeps in a pattern to create a small melted area of material. The target atoms then evaporate and precipitate into solid form onto the sample. Without a good vacuum, film quality suffers as the direct path to the substrate is interrupted. Occasionally, outgassing of the target can cause the vaccum to dump and the deposition to be aborted, in which case the recipe can be re-run with adjusted thickness. The deposited film is measured with a crystal. Power levels and ramp-up condition for the electron beam as well as crystal parameters are highly specific to the material deposited. Single 6" wafer via planetary. Smaller samples can be attached to appropriate clip-holders.