Processing takes place inside a vacuum. Be aware of outgassing or sample requirements (e.g. thin enclosed membranes may not like this)

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Process	Lab	Tool	Process Category	Subcategory	Description	Color Code
+	EBL	Elionix	Photo	Expose	Electron beam lithography system	Red &Green
+	EML	ALD-EML	Deposition	CVD	Atomic Layer Deposition	EML
+	EML	anneal-furnace	Diffusion	Bake	Anneal Furnace	EML
+	EML	asher-EML	Photo	Clean	Oxygen Plasma	EML
+	EML	BalzerSputterer	Deposition	Sputter	Thin sputter coating of samples	EML
+	EML	Box-Furnace	Diffusion	Bake	Anneal Furnace	EML
+	EML	eBeam-AJA	Deposition	Evaporate	Metal and dielectric evaporator	EML
+	EML	OxidationTube	Diffusion	Oxidation	Oxidation Furnace	EML
+	EML	plasmatherm	Deposition, Etch	PECVD, RIE	Plasma Etch and Deposition	EML
+	EML	RTA-EML	Diffusion	Bake	Rapid Thermal Annealing	EML
+	EML	semNeo	Metrology	SEM	Very Basic Electron Microscope	EML
+	EML	SputtererAJA	Deposition	Sputter	Sputter deposition tool	EML
+	ICL	ALD	Deposition	CVD	Atomic Layer Deposition	Red
+	ICL	ALD-Oxford	Deposition	CVD, PECVD	Atomic Layer Deposition	Green
+	ICL	AME5000	Etch	RIE	RIE etcher for frontend silicon processes	Green
+	ICL	asher-ICL	Photo	Clean	Single wafer oxygen plasma for photoresist removal	Green
+	ICL	concept1	Deposition	PECVD	PECVD deposition of oxides, nitrides, and TEOS	Green
+	ICL	DCVD	Deposition	PECVD	PECVD deposition of oxides, nitrides, and a-Si	Green
+	ICL	eBeam-EVO	Deposition	Evaporate	Metal evaporator of CMOS compatible metals	Green
+	ICL	endura	Deposition	Sputter	Metal sputter deposition	Green
+	ICL	epi-Centura	Deposition	CVD	Not open to public	Green
+	ICL	LAM490B	Etch	RIE	Chlorine based plasma etching of silicon	Green
+	ICL	LAM590-ICL	Etch	RIE	Fluorine based plasma etching of silicon oxide and nitrides	Green
+	ICL	Oxford-100_PECVD	Deposition, Etch	PECVD	Dual chamber PECVD and plasma etch tool	Red
+	ICL	Oxford-100_Etch	Deposition, Etch	RIE	Dual chamber PECVD and plasma etch tool	Red
+	ICL	rainbow	Etch	RIE	Chlorine based plasma etcher for metals	Green
+	ICL	RTA2	Diffusion	Bake	Rapid Thermal Annealing	Green
+	ICL	RTA-pieces	Diffusion	Bake	Rapid Thermal Annealing	Red
+	ICL	RTP	Diffusion	Bake	Rapid Thermal Annealing	Green
+	ICL	RTP-Si	Diffusion	Bake	Rapid Thermal Annealing	Green
+	ICL	semZeiss	Metrology	SEM	Scanning Electron Microscope	Red &Green
+	ICL	VTR	Diffusion	CVD	Low stress silicon nitride deposition	Green
+	TRL	AJA-TRL	Deposition	Sputter	Sputter deposition tool	Red
+	TRL	asherMatrix-TRL	Photo	Clean	Single wafer oxygen plasma for photoresist removal	Red
+	TRL	asher-TRL	Photo	Clean	Barrel asher for resist removal	Red &Green
+	TRL	Balzer-Elionix	Deposition	Sputter	SEM or EBL sample preparation	Red
+	TRL	CCNT	Deposition	PECVD	Carbon nanotube growth	Red
+	TRL	eBeamAu	Deposition	Evaporate	Metal evaporator	Red
+	TRL	eBeamFP	Deposition	Evaporate	Fast pumping metal evaporator	Red
+	TRL	HMDS-TRL	Photo	Bake	HMDS oven	Red &Green
+	TRL	LAM590-TRL	Etch	RIE	Fluorine based plasma etching of oxide and nitrides	Red
+	TRL	parylene	Deposition	CVD	Parylene depopsition	Red
+	TRL	plasmaquest	Etch	RIE	Fluorine and Chlorine general purpose plasma deposition and etch tool	Red
+	TRL	Resonetics	Photo	Expose	Laser ablation system	Red
+	TRL	RTA-HiT	Diffusion	Bake	Rapid Thermal Annealing	Red
+	TRL	SAMCO	Etch	RIE	Chlorine based plasma etcher for III-V materials	Red
+	TRL	sts1	Etch	DRIE	Deep reactive ion etcher for silicon	Red
+	TRL	sts2	Etch	DRIE	Deep reactive ion etcher for silicon	Green
+	TRL	sts-CVD	Deposition	PECVD	PECVD deposition of oxides, nitrides, a-Si, SiC, and P-doped a-Si	Red
+	TRL	sts-Pegasus	Etch	DRIE	Deep reactive ion etcher for silicon	Red
+	TRL	UVozone-Au	Etch	Clean	Cleans residual organics	Red
+	TRL	XeF2	Etch	RIE	XeF2 isotropic etching of silicon	Red