Equipment
| Lab and Coral Name | TRL / AJA-TRL |
| Model | AJA ATC |
| Specialist | Eric Lim (Robert Bicchieri) |
| Physical Location | 4F Deposition |
Classification
| Process Category | Deposition |
| Subcategory | Sputter |
| Material Keywords | Dielectrics, CMOS Metals, Non-CMOS Metals, Non-Standard Materials |
| Sample Size | 6" Wafers, 4" Wafers, Pieces |
| Alternative | TRL / eBeam-Au |
| Keywords | single wafer, manual load, load lock, top side of sample, conformal dep, vacuum, plasma, manual operation |
Description
AJA-TRL is a flexible PVD that allows for sputter deposition of numerous metals and ceramics through interchangeable targets (e.g. Ti, Au, Al, Cu, Cr, Ni, Mo, W, Ag). The tool has capabilites for RF and/or DC sputtering, reactive sputtering, and sputtering onto a heated substrate (up to 400C). User supplied targets may be used with PTC approval. Single-wafer deposition, one 6" wafer at a time. System has a moveable crystal monitor (QCM) for measuring deposition rates.
| Best for | Metal sputtering |
| Limitations | No photoresists permitted, use evaporators for those applications |
| Characteristics/FOM | |
| Caution with | Resist and lift-off processes are not permitted, as they contaminate the tool. Conformal coating will also cause liftoff to fail. Be sure the wafer carrier plate is in place and window shutters are closed before starting depostion (i.e. do not deposit onto the viewport windows or the heater window). |
| Machine Charges | 10/wafer + 80/um** |
Documents
SOP
| AJA Sputterer | SOP for the AJA sputterer |
Process Matrix Details
Permitted
Been in the ALDSamples that have been in any of the ALD systems
, Pyrex SubstratesPyrex substrates can be a concern due to high sodium content, which contaminates CMOS frontend tools
, III-V SubstratesAny III-V substrates, e.g. GaAs, GaN, InP, and so on. Note though that many common III-V substrates will also carry the Au flag, but there are some GREEN III-V substrates.
, Germanium on surfaceSamples with germanium on the surface (typically grown films)
, Germanium buriedSamples with germanium buried below a different film
, PiecesWafer pieces may not be handled by the equipment, and are harder to thoroughly clean - preventing them from running in certain tools.
, Gold or RED color codeRED color code substrates. These are gold-contaminated or have been processed in gold contaminated tools. Gold and other metals can contaminate silicon devices (GREEN color code) and have to be separated.
(Adds), Any exposure to CMOS metalIf the sample had ever seen a CMOS metal (or a tool that accepts CMOS metal), then some frontend tools could be contaminated by this.
(Adds), CMOS metal on surfaceCMOS compatible metals exposed on the surface. These are Al,Ni,Pt,Ti,TiN. Other metals such as Au are *NOT* part of this.
(Adds), CMOS metal buriedCMOS compatible metals covered entirely by a different material. These are Al,Ni,Pt,Ti,TiN. Other metals such as Au are *NOT* part of this.
, Been in the STS DRIEThe DRIE etch leaves behind polymer residues on the sidewall ripples, which can be a contamination concern for some tools.
, Been in the SEMA sample viewed in the SEM must have used the appropriate chuck to avoid cross-contamination
, Been in the Concept1The Concep1 deposits dielectrics on GREEN wafers, however it also accepts metal and there can be cross-contamination for diffusion area
, Has PolyimidePolyimide is a very chemically resistant polymer, and can tolerate higher temperatures but cannot be exposed to typical PECVD deposition temperatures or diffusion furnaces. Outgassing can be a concern.
, Has Cured SU8Not fully cured SU8 residues can heavily contaminated plasma chambers or destroy other user's samples, but fully cured SU8 is permitted in certain tools.
, Coming from KOHAfter a KOH etch, the samples must receive a special clean because the K ions are highly contaminating to CMOS frontend tools
, Coming from CMPAfter a CMP, the samples must receive a special clean, because the slurry residues otherwise introduce contamination and particles.
Not Allowed
Ever been in EMLSamples from EML are never permitted to return to ICL or TRL
, Has PhotoresistSamples with photoresist cannot be exposed to high temperatures, which is typical in deposition tools. Outgassing can be a concern.
For more details or help, please consult PTC matrix, email ptc@mtl.mit.edu, or ask the research specialist (Eric Lim)