Robert Bicchieri
Research Specialist, Vacuum Etching
39-215 - (617)253-6418 - bic@mtl.mit.edu

---

Process	Lab	Tool	Process Category	Subcategory	Description	Color Code
+	ICL	LAM490B	Etch	RIE	Chlorine based plasma etching of silicon	Green
+	ICL	LAM590-ICL	Etch	RIE	Fluorine based plasma etching of silicon oxide and nitrides	Green
+	ICL	Oxford-100_PECVD	Deposition, Etch	PECVD	Dual chamber PECVD and plasma etch tool	Red
+	ICL	Oxford-100_Etch	Deposition, Etch	RIE	Dual chamber PECVD and plasma etch tool	Red
+	ICL	VTR	Diffusion	CVD	Low stress silicon nitride deposition	Green
+	TRL	CCNT	Deposition	PECVD	Carbon nanotube growth	Red
+	TRL	LAM590-TRL	Etch	RIE	Fluorine based plasma etching of oxide and nitrides	Red
+	TRL	plasmaquest	Etch	RIE	Fluorine and Chlorine general purpose plasma deposition and etch tool	Red
+	TRL	XeF2	Etch	RIE	XeF2 isotropic etching of silicon	Red