My Process:

Machines by General Keyword: top side of sample

In most tools, only the top side of the wafer is impacted by the process.
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ProcessLabToolProcess CategorySubcategoryDescription
Color Code
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EBL Elionix PhotoExpose Electron beam lithography system
Red &Green
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EML ALD-EML DepositionCVD Atomic Layer Deposition
EML
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EML anneal-furnace DiffusionBake Anneal Furnace
EML
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EML BalzerSputterer DepositionSputter Thin sputter coating of samples
EML
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EML Box-Furnace DiffusionBake Anneal Furnace
EML
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EML coater-EML PhotoCoat Photoresist Coater
EML
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EML dektak-EML MetrologyProfile Surface Profilerometer
EML
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EML eBeam-AJA DepositionEvaporate Metal and dielectric evaporator
EML
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EML filmetrics MetrologyThickness Thin Film Optical Measurement
EML
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EML MA-4 PhotoExpose Contact Lithography Mask Aligner
EML
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EML OxidationTube DiffusionOxidation Oxidation Furnace
EML
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EML plasmatherm Deposition, EtchPECVD, RIE Plasma Etch and Deposition
EML
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EML RTA-EML DiffusionBake Rapid Thermal Annealing
EML
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EML semNeo MetrologySEM Very Basic Electron Microscope
EML
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EML SputtererAJA DepositionSputter Sputter deposition tool
EML
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ICL 4-pt-probe MetrologyElectrical Sheet resistance measurement of semiconductors
Red
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ICL AFM MetrologyProfile Atomic Force Microscope for Surface Analysis
Red &Green
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ICL ALD DepositionCVD Atomic Layer Deposition
Red
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ICL ALD-Oxford DepositionCVD, PECVD Atomic Layer Deposition
Green
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ICL AME5000 EtchRIE RIE etcher for frontend silicon processes
Green
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ICL asher-ICL PhotoClean Single wafer oxygen plasma for photoresist removal
Green
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ICL pTrack PhotoCoat Automated coater and developer track
Green
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ICL concept1 DepositionPECVD PECVD deposition of oxides, nitrides, and TEOS
Green
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ICL cv MetrologyElectrical Electrical characterization of dielectrics
Green
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ICL DCVD DepositionPECVD PECVD deposition of oxides, nitrides, and a-Si
Green
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ICL diesaw PackagingPhysical Wafer dicing saw
Red
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ICL diesaw-3240 PackagingPhysical Wafer dicing saw
Red
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ICL eBeam-EVO DepositionEvaporate Metal evaporator of CMOS compatible metals
Green
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ICL endura DepositionSputter Metal sputter deposition
Green
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ICL epi-Centura DepositionCVD Not open to public
Green
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ICL GnP WetOther Chemical Mechanical Polishing to planarize surfaces
Red &Green
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ICL goldwire PackagingPhysical Gold ball bonder for device packaging
Red
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ICL i-stepper PhotoExpose i-line stepper
Red &Green
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ICL LAM490B EtchRIE Chlorine based plasma etching of silicon
Green
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ICL LAM590-ICL EtchRIE Fluorine based plasma etching of silicon oxide and nitrides
Green
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ICL Oxford-100_PECVD Deposition, EtchPECVD Dual chamber PECVD and plasma etch tool
Red
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ICL Oxford-100_Etch Deposition, EtchRIE Dual chamber PECVD and plasma etch tool
Red
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ICL P10 MetrologyProfile Stylus profilerometer
Green
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ICL rainbow EtchRIE Chlorine based plasma etcher for metals
Green
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ICL RTA2 DiffusionBake Rapid Thermal Annealing
Green
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ICL RTA-pieces DiffusionBake Rapid Thermal Annealing
Red
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ICL RTP DiffusionBake Rapid Thermal Annealing
Green
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ICL RTP-Si DiffusionBake Rapid Thermal Annealing
Green
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ICL semZeiss MetrologySEM Scanning Electron Microscope
Red &Green
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ICL SM-300 MetrologyThickness Thickness measurement for CMP processing
Red &Green
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ICL UV1280 MetrologyThickness Thin film characterization
Green
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ICL wykoICL MetrologyProfile Optical profiling system
Green
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TRL AJA-TRL DepositionSputter Sputter deposition tool
Red
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TRL asherMatrix-TRL PhotoClean Single wafer oxygen plasma for photoresist removal
Red
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TRL Balzer-Elionix DepositionSputter SEM or EBL sample preparation
Red
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TRL CCNT DepositionPECVD Carbon nanotube growth
Red
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TRL coater PhotoCoat Manual spin-coater for photoresists
Red &Green
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TRL dek-NoAu MetrologyProfile Stylus Profilerometer
Green
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TRL dektak-XT MetrologyProfile Stylus Profilerometer
Red
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TRL develop-Brewer PhotoCoat Resist develop and postbake
Red &Green
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TRL eBeamAu DepositionEvaporate Metal evaporator
Red
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TRL eBeamFP DepositionEvaporate Fast pumping metal evaporator
Red
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TRL ellipsometer-TRL MetrologyThickness Thin film thickness measurement
Red &Green
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TRL EV1 PhotoExpose Contact mask aligner
Red &Green
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TRL EV501 PhotoBond Bonder system to apply heat, vacuum and pressure
Red &Green
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TRL EV620 PhotoBond Aligner for bonding
Red &Green
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TRL EV-LC PhotoExpose Contact mask aligner
Red &Green
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TRL Filmetrics-TRL MetrologyThickness Thin film thickness measurement
Red &Green
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TRL Hall-probe MetrologyElectrical Carrier measurement
Red
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TRL Heidelberg PhotoExpose Laser direct-write exposure for wafers and masks
Red &Green
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TRL hotplate1 PhotoBake Hotplate for lithography
Red &Green
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TRL hotplate2 PhotoBake Hotplate for lithography
Red &Green
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TRL hotplate300 PhotoBake Hotplate for lithography
Red &Green
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TRL IV-probe MetrologyElectrical Probe station with curve tracer for IV measurement
Red
  +  
TRL LAM590-TRL EtchRIE Fluorine based plasma etching of oxide and nitrides
Red
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TRL MA-6 PhotoExpose Contact mask aligner
Red &Green
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TRL MLA-150 PhotoExpose Direct-write lithography for wafers and larger pieces
Red &Green
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TRL nanospec MetrologyThickness Thin film thickness measurement
Red &Green
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TRL OAI-Flood PhotoExpose Flood exposure for image reversal resists
Red &Green
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TRL parylene DepositionCVD Parylene depopsition
Red
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TRL plasmaquest EtchRIE Fluorine and Chlorine general purpose plasma deposition and etch tool
Red
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TRL PMMAspinner PhotoCoat Manual coater for PMMA and other photoresists
Red &Green
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TRL PZTcoater DepositionSpin-Coat Coater to apply PZT films
Red
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TRL Resonetics PhotoExpose Laser ablation system
Red
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TRL RTA-HiT DiffusionBake Rapid Thermal Annealing
Red
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TRL SAMCO EtchRIE Chlorine based plasma etcher for III-V materials
Red
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TRL sts1 EtchDRIE Deep reactive ion etcher for silicon
Red
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TRL sts2 EtchDRIE Deep reactive ion etcher for silicon
Green
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TRL sts-CVD DepositionPECVD PECVD deposition of oxides, nitrides, a-Si, SiC, and P-doped a-Si
Red
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TRL sts-Pegasus EtchDRIE Deep reactive ion etcher for silicon
Red
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TRL SU8spinner PhotoCoat Manual spin-coater for SU8 resists
Purple
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TRL TBM-8 PhotoBond Front-to-back alignement measurement
Red &Green
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TRL UVozone-Au EtchClean Cleans residual organics
Red
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TRL WYKO MetrologyProfile Optical profiling system
Red &Green
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TRL XeF2 EtchRIE XeF2 isotropic etching of silicon
Red