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Photo Deposition Etch Diffusion Wet Metrology Packaging Procedures

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Silicon dioxide.

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Process	Lab	Tool	Process Category	Subcategory	Description	Color Code
+	EML	acid-hood-EML	Wet	Solvents	General Purpose Acid Fume-Hood	EML
+	EML	anneal-furnace	Diffusion	Bake	Anneal Furnace	EML
+	EML	Box-Furnace	Diffusion	Bake	Anneal Furnace	EML
+	EML	filmetrics	Metrology	Thickness	Thin Film Optical Measurement	EML
+	EML	OxidationTube	Diffusion	Oxidation	Oxidation Furnace	EML
+	EML	plasmatherm	Deposition, Etch	PECVD, RIE	Plasma Etch and Deposition	EML
+	EML	RTA-EML	Diffusion	Bake	Rapid Thermal Annealing	EML
+	ICL	5A-GateOx	Diffusion	Oxidation	Diffusion tube for gate oxide growth	Green
+	ICL	5B-Anneal	Diffusion	Bake	Annealing tube	Green
+	ICL	5C-FieldOx	Diffusion	Oxidation	Diffusion tube for wet oxide growth of thicker films	Green
+	ICL	5D-ThickOx	Diffusion	Oxidation	Diffusion tube for wet oxide growth of thicker films	Green
+	ICL	6C-LTO	Diffusion	CVD	Low temperature CVD oxide deposition	Green
+	ICL	AME5000	Etch	RIE	RIE etcher for frontend silicon processes	Green
+	ICL	concept1	Deposition	PECVD	PECVD deposition of oxides, nitrides, and TEOS	Green
+	ICL	DCVD	Deposition	PECVD	PECVD deposition of oxides, nitrides, and a-Si	Green
+	ICL	GnP	Wet	Other	Chemical Mechanical Polishing to planarize surfaces	Red &Green
+	ICL	LAM490B	Etch	RIE	Chlorine based plasma etching of silicon	Green
+	ICL	LAM590-ICL	Etch	RIE	Fluorine based plasma etching of silicon oxide and nitrides	Green
+	ICL	oxEtch-BOE	Wet	Acids	Silicon dioxide etch bath	Green
+	ICL	Oxford-100_PECVD	Deposition, Etch	PECVD	Dual chamber PECVD and plasma etch tool	Red
+	ICL	Oxford-100_Etch	Deposition, Etch	RIE	Dual chamber PECVD and plasma etch tool	Red
+	ICL	rca-ICL	Diffusion	Clean	Wafer cleaning before diffusion tubes	Green
+	ICL	UV1280	Metrology	Thickness	Thin film characterization	Green
	MTL	Procedures-Deposition	Procedures	Deposit	Deposition of thin films	Red &Green
	MTL	Procedures-Etching	Procedures	Etch	Etching of materials	Red &Green
	MTL	Procedures-Metrology	Procedures	Metrology	Test and Measurement	Red &Green
+	TRL	A1-GateOx	Diffusion	Oxidation	Thermal Oxidation for Green Silicon Wafers	Green
+	TRL	A2-WetOxBond	Diffusion	Oxidation	Thermal Oxidation and other thermal process for GREEN Si wafers	Green
+	TRL	A3-Sinter	Diffusion	Bake	Sintering for GREEN Si wafers	Green
+	TRL	acid-hood	Wet	Acids	Acid processing station	Red &Green
+	TRL	B2-Ox-alloy-Poly	Diffusion	Oxidation	Thermal Oxidation and LPCVD Polysilicon for RED wafers	Green
+	TRL	B3-DryOx	Diffusion	Oxidation	Thermal Oxidation	Green
+	TRL	ellipsometer-TRL	Metrology	Thickness	Thin film thickness measurement	Red &Green
+	TRL	Filmetrics-TRL	Metrology	Thickness	Thin film thickness measurement	Red &Green
+	TRL	Greenflo	Wet	Acids	Acid processing station	Red &Green
+	TRL	HMDS-TRL	Photo	Bake	HMDS oven	Red &Green
+	TRL	LAM590-TRL	Etch	RIE	Fluorine based plasma etching of oxide and nitrides	Red
+	TRL	nanospec	Metrology	Thickness	Thin film thickness measurement	Red &Green
+	TRL	plasmaquest	Etch	RIE	Fluorine and Chlorine general purpose plasma deposition and etch tool	Red
+	TRL	sts-CVD	Deposition	PECVD	PECVD deposition of oxides, nitrides, a-Si, SiC, and P-doped a-Si	Red