Etching is primarily isotropic (etches uniformly in all directions)

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Process	Lab	Tool	Process Category	Subcategory	Description	Color Code
+	EML	acid-hood-EML	Wet	Solvents	General Purpose Acid Fume-Hood	EML
+	EML	asher-EML	Photo	Clean	Oxygen Plasma	EML
+	EML	photo-hood-EML	Wet	Solvents	Solvent Fume hood for lithography	EML
+	EML	plasmatherm	Deposition, Etch	PECVD, RIE	Plasma Etch and Deposition	EML
+	EML	SolventHood-EML	Wet	Solvents	Solvent Fume hood for lithography	EML
+	ICL	asher-ICL	Photo	Clean	Single wafer oxygen plasma for photoresist removal	Green
+	ICL	nitrEtch-HotPhos	Wet	Acids	Hot phosphoric nitride etch bath	Green
+	ICL	oxEtch-BOE	Wet	Acids	Silicon dioxide etch bath	Green
+	ICL	premetal-Piranha	Wet	Acids	Piranha resist removal and cleaning station	Green
+	ICL	rca-ICL	Diffusion	Clean	Wafer cleaning before diffusion tubes	Green
+	ICL	TMAH-KOHhood	Wet	Acids	Silicon bulk wet etching	Red &Green
+	TRL	acid-hood	Wet	Acids	Acid processing station	Red &Green
+	TRL	asherMatrix-TRL	Photo	Clean	Single wafer oxygen plasma for photoresist removal	Red
+	TRL	asher-TRL	Photo	Clean	Barrel asher for resist removal	Red &Green
+	TRL	Greenflo	Wet	Acids	Acid processing station	Red &Green
+	TRL	photo-wet-Au	Wet	Solvents	Solvent fume hood with sonicator	Red &Green
+	TRL	photo-wet-l	Wet	Solvents	Wetbench for photoresist development	Red &Green
+	TRL	photo-wet-r	Wet	Solvents	Wetbench for photoresist development	Red &Green
+	TRL	PZTfurnace	Deposition	Bake	Bake oven for PZT coated wafers	Red
+	TRL	rca-TRL	Diffusion	Clean	Wafer cleaning before diffusion tubes	Green
+	TRL	Resonetics	Photo	Expose	Laser ablation system	Red
+	TRL	SolventHood-TRL	Wet	Solvents	Solvent fume hood	Red &Green
+	TRL	UVozone-Au	Etch	Clean	Cleans residual organics	Red
+	TRL	XeF2	Etch	RIE	XeF2 isotropic etching of silicon	Red