Machines by Location: 2F 2-North Etch
| Process | Lab | Tool | Process Category | Subcategory | Description | |
|---|---|---|---|---|---|---|
| ICL | AFM | Metrology | Profile | Atomic Force Microscope for Surface Analysis | ||
| ICL | LAM490B | Etch | RIE | Chlorine based plasma etching of silicon | ||
| ICL | LAM590-ICL | Etch | RIE | Fluorine based plasma etching of silicon oxide and nitrides |