Machines by Location: 4F External-Photo
| Process | Lab | Tool | Process Category | Subcategory | Description | |
|---|---|---|---|---|---|---|
| TRL | Balzer-Elionix | Deposition | Sputter | SEM or EBL sample preparation | ||
| TRL | Heidelberg | Photo | Expose | Laser direct-write exposure for wafers and masks | ||
| TRL | PMMAspinner | Photo | Coat | Manual coater for PMMA and other photoresists |