Machines by Location: 4F External-Photo
Process | Lab | Tool | Process Category | Subcategory | Description | |
---|---|---|---|---|---|---|
TRL | Balzer-Elionix | Deposition | Sputter | SEM or EBL sample preparation | ||
TRL | Heidelberg | Photo | Expose | Laser direct-write exposure for wafers and masks | ||
TRL | PMMAspinner | Photo | Coat | Manual coater for PMMA and other photoresists |