Machines by Location: 2F 3-South Photo
Process | Lab | Tool | Process Category | Subcategory | Description | |
---|---|---|---|---|---|---|
ICL | asher-ICL | Photo | Clean | Single wafer oxygen plasma for photoresist removal | ||
ICL | pTrack | Photo | Coat | Automated coater and developer track | ||
ICL | nitrEtch-HotPhos | Wet | Acids | Hot phosphoric nitride etch bath | ||
ICL | oxEtch-BOE | Wet | Acids | Silicon dioxide etch bath |