Machines by Location: 2F 3-South Photo
| Process | Lab | Tool | Process Category | Subcategory | Description | |
|---|---|---|---|---|---|---|
| ICL | asher-ICL | Photo | Clean | Single wafer oxygen plasma for photoresist removal | ||
| ICL | pTrack | Photo | Coat | Automated coater and developer track | ||
| ICL | nitrEtch-HotPhos | Wet | Acids | Hot phosphoric nitride etch bath | ||
| ICL | oxEtch-BOE | Wet | Acids | Silicon dioxide etch bath |