Machines by Specialist: Donal Jamieson

Donal Jamieson
Research Specialist, Vacuum Etching
39-225 - (617)452-2983 - donal@mtl.mit.edu
| Process | Lab | Tool | Process Category | Subcategory | Description | |
|---|---|---|---|---|---|---|
| ICL | ALD | Deposition | CVD | Atomic Layer Deposition | ||
| ICL | ALD-Oxford | Deposition | CVD, PECVD | Atomic Layer Deposition | ||
| TRL | sts1 | Etch | DRIE | Deep reactive ion etcher for silicon | ||
| TRL | sts2 | Etch | DRIE | Deep reactive ion etcher for silicon | ||
| TRL | sts-CVD | Deposition | PECVD | PECVD deposition of oxides, nitrides, a-Si, SiC, and P-doped a-Si | ||
| TRL | sts-Pegasus | Etch | DRIE | Deep reactive ion etcher for silicon |