Machines by Sample Size: 8
Process | Lab | Tool | Keywords | 0 | Description | |
---|---|---|---|---|---|---|
EBL | Elionix | ERRORERROR | Electron beam lithography system | |||
ICL | wykoICL | ERRORERROR | Optical profiling system | |||
TRL | Filmetrics-TRL | ERRORERROR | Thin film thickness measurement | |||
TRL | Heidelberg | ERRORERROR | Laser direct-write exposure for wafers and masks | |||
TRL | IV-probe | ERRORERROR | Probe station with curve tracer for IV measurement | |||
TRL | MLA-150 | ERRORERROR | Direct-write lithography for wafers and larger pieces | |||
TRL | photo-wet-Au | ERRORERROR | Solvent fume hood with sonicator | |||
TRL | photo-wet-l | ERRORERROR | Wetbench for photoresist development | |||
TRL | photo-wet-r | ERRORERROR | Wetbench for photoresist development | |||
TRL | SolventHood-TRL | ERRORERROR | Solvent fume hood | |||
TRL | varTemp | ERRORERROR | Bake oven for variable temperature | |||
TRL | WYKO | ERRORERROR | Optical profiling system | |||
LEAP | X-rayInspection | ERRORERROR | X-Ray imaging | |||
LEAP | QuickVisionMicroscope | ERRORERROR | Automated imaging microscope |