My Process:

Machines by Sample Size: 8

These wafers are really an exception at MTL, although some equipment is able to process them.
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ProcessLabToolKeywords0Description
Color Code
  +  
EBL Elionix ERRORERROR Electron beam lithography system
Red &Green
  +  
ICL wykoICL ERRORERROR Optical profiling system
Green
  +  
TRL Filmetrics-TRL ERRORERROR Thin film thickness measurement
Red &Green
  +  
TRL Heidelberg ERRORERROR Laser direct-write exposure for wafers and masks
Red &Green
  +  
TRL IV-probe ERRORERROR Probe station with curve tracer for IV measurement
Red
  +  
TRL MLA-150 ERRORERROR Direct-write lithography for wafers and larger pieces
Red &Green
  +  
TRL photo-wet-Au ERRORERROR Solvent fume hood with sonicator
Red &Green
  +  
TRL photo-wet-l ERRORERROR Wetbench for photoresist development
Red &Green
  +  
TRL photo-wet-r ERRORERROR Wetbench for photoresist development
Red &Green
  +  
TRL SolventHood-TRL ERRORERROR Solvent fume hood
Red &Green
  +  
TRL varTemp ERRORERROR Bake oven for variable temperature
Red
  +  
TRL WYKO ERRORERROR Optical profiling system
Red &Green
  +  
LEAP X-rayInspection ERRORERROR X-Ray imaging
Red
  +  
LEAP QuickVisionMicroscope ERRORERROR Automated imaging microscope
Red