Machines by Sample Size: 8
| Process | Lab | Tool | Keywords | 0 | Description | |
|---|---|---|---|---|---|---|
| EBL | Elionix | ERRORERROR | Electron beam lithography system | |||
| ICL | wykoICL | ERRORERROR | Optical profiling system | |||
| TRL | Filmetrics-TRL | ERRORERROR | Thin film thickness measurement | |||
| TRL | Heidelberg | ERRORERROR | Laser direct-write exposure for wafers and masks | |||
| TRL | IV-probe | ERRORERROR | Probe station with curve tracer for IV measurement | |||
| TRL | MLA-150 | ERRORERROR | Direct-write lithography for wafers and larger pieces | |||
| TRL | photo-wet-Au | ERRORERROR | Solvent fume hood with sonicator | |||
| TRL | photo-wet-l | ERRORERROR | Wetbench for photoresist development | |||
| TRL | photo-wet-r | ERRORERROR | Wetbench for photoresist development | |||
| TRL | SolventHood-TRL | ERRORERROR | Solvent fume hood | |||
| TRL | varTemp | ERRORERROR | Bake oven for variable temperature | |||
| TRL | WYKO | ERRORERROR | Optical profiling system | |||
| LEAP | X-rayInspection | ERRORERROR | X-Ray imaging | |||
| LEAP | QuickVisionMicroscope | ERRORERROR | Automated imaging microscope |