Machines by Location: 4F Main-South
Process | Lab | Tool | Process Category | Subcategory | Description | |
---|---|---|---|---|---|---|
TRL | acid-hood | Wet | Acids | Acid processing station | ||
TRL | asherMatrix-TRL | Photo | Clean | Single wafer oxygen plasma for photoresist removal | ||
TRL | rca-TRL | Diffusion | Clean | Wafer cleaning before diffusion tubes | ||
TRL | RTA-HiT | Diffusion | Bake | Rapid Thermal Annealing | ||
TRL | sts1 | Etch | DRIE | Deep reactive ion etcher for silicon | ||
TRL | sts2 | Etch | DRIE | Deep reactive ion etcher for silicon | ||
TRL | sts-Pegasus | Etch | DRIE | Deep reactive ion etcher for silicon | ||
TRL | XeF2 | Etch | RIE | XeF2 isotropic etching of silicon |