Machines by Location: 4F Main-South
| Process | Lab | Tool | Process Category | Subcategory | Description | |
|---|---|---|---|---|---|---|
| TRL | acid-hood | Wet | Acids | Acid processing station | ||
| TRL | asherMatrix-TRL | Photo | Clean | Single wafer oxygen plasma for photoresist removal | ||
| TRL | rca-TRL | Diffusion | Clean | Wafer cleaning before diffusion tubes | ||
| TRL | RTA-HiT | Diffusion | Bake | Rapid Thermal Annealing | ||
| TRL | sts1 | Etch | DRIE | Deep reactive ion etcher for silicon | ||
| TRL | sts2 | Etch | DRIE | Deep reactive ion etcher for silicon | ||
| TRL | sts-Pegasus | Etch | DRIE | Deep reactive ion etcher for silicon | ||
| TRL | XeF2 | Etch | RIE | XeF2 isotropic etching of silicon |